Gene Lee
15Patents
5h-index
32Co-inventors
66Inventor score
Filing activity: Mar 5, 1999 → Aug 19, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6235643A | Method for etching a trench having rounded top and bottom corners in a silicon substrate | Electricity | 270 | Expired |
| US6583063B1 | Plasma etching of silicon using fluorinated gas mixtures | Electricity | 43 | Expired |
| US9299580B2 | High aspect ratio plasma etch for 3D NAND semiconductor applications | Electricity | 14 | Active |
| US8658541B2 | Method of controlling trench microloading using plasma pulsing | Electricity | 9 | Active |
| US9595451B1 | Highly selective etching methods for etching dielectric materials | Electricity | 6 | Active |
| US9054045B2 | Method for isotropic etching | Electricity | 4 | Active |
| US10636675B2 | Methods of etching metal-containing layers | Electricity | 3 | Active |
| US11527408B2 | Multiple spacer patterning schemes | Electricity | 2 | Active |
| US10957558B2 | Methods of etching metal-containing layers | Electricity | 2 | Active |
| US9852923B2 | Mask etch for patterning | Electricity | 1 | Active |
| US11315787B2 | Multiple spacer patterning schemes | Electricity | 0 | Active |
| US11658043B2 | Selective anisotropic metal etch | Electricity | 0 | Active |
| US12211693B2 | Spacer patterning process with flat top profile | Electricity | 0 | Active |
| US12266537B2 | Selective barrier metal etching | Electricity | 0 | Active |
| US12322602B2 | Recessed metal etching methods | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.