Inventor · Nirasaki, JP

Kunihiro Tada

19Patents
7h-index
19Co-inventors
63Inventor score

Filing activity: Aug 24, 1995 → Sep 18, 2015

Most-cited inventions

PatentTitleAreaCited byStatus
US5709757A Film forming and dry cleaning apparatus and method Emerging Cross-Sectional Technologies 78 Expired
US6051281A Method of forming a titanium film and a barrier metal film on a surface of a substrate through lamination Electricity 17 Expired
US5942282A Method for depositing a titanium film Electricity 15 Expired
US6919273B1 Method for forming TiSiN film, diffusion preventive film comprising TiSiN film, semiconductor device and its production method, and apparatus for forming TiSiN film Electricity 9 Expired
US6537621B1 Method of forming a titanium film and a barrier film on a surface of a substrate through lamination Electricity 8 Expired
US7153773B2 TiSiN film forming method, diffusion barrier TiSiN film, semiconductor device, method of fabricating the same and TiSiN film forming system Electricity 7 Expired
US6451388B1 Method of forming titanium film by chemical vapor deposition Electricity 7 Expired
US6177149A Method of forming titanium film by CVD Chemistry; Metallurgy 7 Expired
US6004872A Method of manufacturing semiconductor device Electricity 6 Expired
US6197674A CVD-Ti film forming method Electricity 4 Expired
US6069093A Process of forming metal films and multi layer structure Electricity 4 Expired
US7737005B2 Method for forming Ti film and TiN film, contact structure, computer readable storing medium and computer program Emerging Cross-Sectional Technologies 4 Active
US7484513B2 Method of forming titanium film by CVD Electricity 3 Expired
US8257790B2 Ti-containing film formation method and storage medium Chemistry; Metallurgy 3 Active
US8106335B2 Processing apparatus and heater unit Electricity 2 Active
US8124168B2 Substrate processing method and substrate processing apparatus Electricity 1 Active
US6841203B2 Method of forming titanium film by CVD Electricity 1 Expired
US8785310B2 Method of forming conformal metal silicide films Electricity 1 Active
US10815567B2 Deposition device and deposition method Chemistry; Metallurgy 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.