Peter Storck
12Patents
4h-index
26Co-inventors
56Inventor score
Filing activity: May 24, 2001 → Apr 30, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7785706B2 | Semiconductor wafer and process for its production | Emerging Cross-Sectional Technologies | 13 | Active |
| US6995077B2 | Epitaxially coated semiconductor wafer and process for producing it | Emerging Cross-Sectional Technologies | 8 | Expired |
| US6630024B2 | Method for the production of an epitaxially grown semiconductor wafer | Chemistry; Metallurgy | 8 | Expired |
| US8268076B2 | SOI wafers having MxOy oxide layers on a substrate wafer and an amorphous interlayer adjacent the substrate wafer | Emerging Cross-Sectional Technologies | 4 | Active |
| US8093143B2 | Method for producing a wafer comprising a silicon single crystal substrate having a front and a back side and a layer of SiGe deposited on the front side | Emerging Cross-Sectional Technologies | 4 | Active |
| US7723214B2 | Multilayer structure comprising a substrate and a layer of silicon and germanium deposited heteroepitaxially thereon, and a process for producing it | Electricity | 2 | Active |
| US8115195B2 | Semiconductor wafer with a heteroepitaxial layer and a method for producing the wafer | Electricity | 1 | Active |
| US9691632B2 | Epitaxial wafer and a method of manufacturing thereof | Electricity | 0 | Active |
| US12313578B2 | Method for producing semiconductor wafers | Chemistry; Metallurgy | 0 | Active |
| US9923050B2 | Semiconductor wafer and a method for producing the semiconductor wafer | Electricity | 0 | Active |
| US10192739B2 | Layered semiconductor substrate with reduced bow having a group III nitride layer and method for manufacturing it | Electricity | 0 | Active |
| US6887775B2 | Process and apparatus for epitaxially coating a semiconductor wafer and epitaxially coated semiconductor wafer | Emerging Cross-Sectional Technologies | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.