Pin Chia Su
25Patents
5h-index
44Co-inventors
69Inventor score
Filing activity: Jun 14, 2002 → Feb 17, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7588946B2 | Controlling system for gate formation of semiconductor devices | Electricity | 25 | Expired |
| US6777334B2 | Method for protecting a wafer backside from etching damage | Electricity | 11 | Expired |
| US7973293B2 | Implantation quality improvement by xenon/hydrogen dilution gas | Electricity | 6 | Active |
| US7306746B2 | Critical dimension control in a semiconductor fabrication process | Electricity | 5 | Expired |
| US7995323B2 | Method and apparatus for securely dechucking wafers | Electricity | 5 | Active |
| US8416555B2 | System for securely dechucking wafers | Electricity | 4 | Active |
| US8816415B2 | Photodiode with concave reflector | Electricity | 4 | Active |
| US7018928B2 | Plasma treatment method to reduce silicon erosion over HDI silicon regions | Electricity | 3 | Expired |
| US8000081B2 | Method and apparatus for safely dechucking wafers | Electricity | 2 | Active |
| US6808589B2 | Wafer transfer robot having wafer blades equipped with sensors | Electricity | 2 | Expired |
| US11949000B2 | Metal gate structures and methods of fabricating the same in field-effect transistors | Electricity | 1 | Active |
| US8884390B2 | Backside illumination image sensor chips and methods for forming the same | Electricity | 1 | Active |
| US7910014B2 | Method and system for improving wet chemical bath process stability and productivity in semiconductor manufacturing | Electricity | 1 | Active |
| US11588038B2 | Circuit structure with gate configuration | Electricity | 1 | Active |
| US9142588B2 | Backside illumination image sensor chips and methods for forming the same | Electricity | 1 | Active |
| US7101748B2 | Method of integrating the formation of a shallow junction N channel device with the formation of P channel, ESD and input/output devices | Electricity | 0 | Expired |
| US8696930B2 | Silicon wafer reclamation process | Electricity | 0 | Active |
| US9240503B2 | Methods of manufacturing and using a photodiode with concave reflector | Electricity | 0 | Active |
| US11476351B2 | Metal gate structures and methods of fabricating the same in field-effect transistors | Electricity | 0 | Active |
| US7851374B2 | Silicon wafer reclamation process | Electricity | 0 | Active |
| US8049213B2 | Feature dimension measurement | Electricity | 0 | Active |
| US12021130B2 | Circuit structure with gate configuration | Electricity | 0 | Active |
| US9450014B2 | Backside illumination image sensor chips and methods for forming the same | Electricity | 0 | Active |
| US12113120B2 | Gate electrode having a work-function layer including materials with different average grain sizes | Electricity | 0 | Active |
| US11502185B2 | Methods of manufacturing a gate electrode having metal layers with different average grain sizes | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.