Rashid Bashir
63Patents
20h-index
81Co-inventors
91Inventor score
Filing activity: Dec 31, 1991 → Jun 10, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6716620B2 | Biosensor and related method | Physics | 207 | Expired |
| US5780343A | Method of producing high quality silicon surface for selective epitaxial growth of silicon | Emerging Cross-Sectional Technologies | 116 | Expired |
| US6012335A | High sensitivity micro-machined pressure sensors and acoustic transducers | Performing Operations; Transporting | 95 | Expired |
| US5914523A | Semiconductor device trench isolation structure with polysilicon bias voltage contact | Electricity | 73 | Expired |
| US6935165B2 | Microscale sensor element and related device and method of use | Physics | 73 | Expired |
| US6121148A | Semiconductor device trench isolation structure with polysilicon bias voltage contact | Electricity | 66 | Expired |
| US5439833A | Method of making truly complementary and self-aligned bipolar and CMOS transistor structures with minimized base and gate resistances and parasitic capacitance | Emerging Cross-Sectional Technologies | 66 | Expired |
| US8945912B2 | DNA sequencing and amplification systems using nanoscale field effect sensor arrays | Physics | 62 | Active |
| US7306924B2 | Biosensor and related method | Physics | 59 | Expired |
| US5773350A | Method for forming a self-aligned bipolar junction transistor with silicide extrinsic base contacts and selective epitaxial grown intrinsic base | Emerging Cross-Sectional Technologies | 57 | Expired |
| US5811315A | Method of forming and planarizing deep isolation trenches in a silicon-on-insulator (SOI) structure | Emerging Cross-Sectional Technologies | 47 | Expired |
| US5747353A | Method of making surface micro-machined accelerometer using silicon-on-insulator technology | Emerging Cross-Sectional Technologies | 44 | Expired |
| US5930635A | Complementary Si/SiGe heterojunction bipolar technology | Electricity | 37 | Expired |
| US5411913A | Simple planarized trench isolation and field oxide formation using poly-silicon | Electricity | 34 | Expired |
| US5385861A | Planarized trench and field oxide and poly isolation scheme | Emerging Cross-Sectional Technologies | 29 | Expired |
| US5683932A | Method of fabricating a planarized trench and field oxide isolation structure | Emerging Cross-Sectional Technologies | 26 | Expired |
| US5888845A | Method of making high sensitivity micro-machined pressure sensors and acoustic transducers | Performing Operations; Transporting | 24 | Expired |
| US6362064B1 | Elimination of walkout in high voltage trench isolated devices | Electricity | 24 | Expired |
| US9689835B2 | Amplified dual-gate bio field effect transistor | Electricity | 22 | Active |
| US5397722A | Process for making self-aligned source/drain polysilicon or polysilicide contacts in field effect transistors | Emerging Cross-Sectional Technologies | 21 | Expired |
| US6346452B1 | Method for controlling an N-type dopant concentration depth profile in bipolar transistor epitaxial layers | Electricity | 19 | Expired |
| US7435579B2 | Biosensor and related method | Physics | 19 | Active |
| US5827762A | Method for forming buried interconnect structue having stability at high temperatures | Electricity | 18 | Expired |
| US5691232A | Planarized trench and field oxide isolation scheme | Emerging Cross-Sectional Technologies | 18 | Expired |
| US7413891B2 | Apparatus and method for detecting live cells with an integrated filter and growth detection device | Emerging Cross-Sectional Technologies | 17 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.