Siddhartha Panda
39Patents
10h-index
78Co-inventors
78Inventor score
Filing activity: Jul 11, 1994 → Mar 21, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7288482B2 | Silicon nitride etching methods | Electricity | 247 | Expired |
| US8783948B2 | Flexible temperature sensor and sensor array | Emerging Cross-Sectional Technologies | 36 | Active |
| US7176481B2 | In situ doped embedded sige extension and source/drain for enhanced PFET performance | Electricity | 33 | Expired |
| US7135724B2 | Structure and method for making strained channel field effect transistor using sacrificial spacer | Electricity | 30 | Expired |
| US5525320A | Process for aluminum nitride powder production | Chemistry; Metallurgy | 24 | Expired |
| US6743727B2 | Method of etching high aspect ratio openings | Electricity | 15 | Expired |
| US7087532B2 | Formation of controlled sublithographic structures | Electricity | 12 | Expired |
| US7709317B2 | Method to increase strain enhancement with spacerless FET and dual liner process | Electricity | 12 | Active |
| US7525161B2 | Strained MOS devices using source/drain epitaxy | Electricity | 11 | Active |
| US7442618B2 | Method to engineer etch profiles in Si substrate for advanced semiconductor devices | Electricity | 11 | Active |
| US7645656B2 | Structure and method for making strained channel field effect transistor using sacrificial spacer | Electricity | 5 | Active |
| US6709917B2 | Method to increase the etch rate and depth in high aspect ratio structure | Electricity | 5 | Expired |
| US6706586B1 | Method of trench sidewall enhancement | Electricity | 4 | Expired |
| US7459382B2 | Field effect device with reduced thickness gate | Electricity | 4 | Active |
| US7393746B2 | Post-silicide spacer removal | Electricity | 4 | Active |
| US7344991B2 | Method and apparatus for multilayer photoresist dry development | Human Necessities | 3 | Expired |
| US7405436B2 | Stressed field effect transistors on hybrid orientation substrate | Electricity | 3 | Expired |
| US7754615B2 | Method and apparatus for detecting endpoint in a dry etching system by monitoring a superimposed DC current | Electricity | 3 | Active |
| US7977185B2 | Method and apparatus for post silicide spacer removal | Electricity | 3 | Expired |
| US10534541B2 | Asynchronous discovery of initiators and targets in a storage fabric | Physics | 2 | Active |
| US8892811B2 | Reducing write amplification in a flash memory | Physics | 2 | Active |
| US7687829B2 | Stressed field effect transistors on hybrid orientation substrate | Electricity | 2 | Active |
| US10719439B2 | Garbage collection of a storage device | Physics | 2 | Active |
| US8799631B2 | Dynamically select operating system (OS) to boot based on hardware states | Physics | 2 | Active |
| US7186660B2 | Silicon precursors for deep trench silicon etch processes | Electricity | 2 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.