Tiesheng Li
59Patents
10h-index
40Co-inventors
78Inventor score
Filing activity: Sep 27, 2004 → Mar 13, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10270191B1 | Plug and connector assembly | Electricity | 44 | Active |
| US7285822B2 | Power MOS device | Electricity | 32 | Expired |
| US7605425B2 | Power MOS device | Electricity | 22 | Active |
| US7767526B1 | High density trench MOSFET with single mask pre-defined gate and contact trenches | Electricity | 16 | Active |
| US7879676B2 | High density trench mosfet with single mask pre-defined gate and contact trenches | Electricity | 15 | Active |
| US10833437B2 | High-speed connector on high-density mini version chip side | Electricity | 15 | Active |
| US7923774B2 | Power MOS device with conductive contact layer | Electricity | 14 | Active |
| US7667264B2 | Shallow source MOSFET | Electricity | 11 | Expired |
| US8546879B2 | High density lateral DMOS with recessed source contact | Electricity | 10 | Active |
| US7800169B2 | Power MOS device | Electricity | 10 | Active |
| US7875541B2 | Shallow source MOSFET | Electricity | 10 | Active |
| US8597998B2 | Power MOS device fabrication | Electricity | 9 | Active |
| US9281393B2 | Super junction semiconductor device and associated fabrication method | Electricity | 8 | Active |
| US7977193B1 | Trench-gate MOSFET with capacitively depleted drift region | Electricity | 8 | Active |
| US8288229B2 | Power MOS device fabrication | Electricity | 7 | Active |
| US8163618B2 | Power MOSFET device structure for high frequency applications | Electricity | 7 | Active |
| US8723178B2 | Integrated field effect transistors with high voltage drain sensing | Electricity | 7 | Active |
| US10205256B2 | Plug and electrical connector component | Electricity | 6 | Active |
| US7659570B2 | Power MOSFET device structure for high frequency applications | Electricity | 6 | Expired |
| US8963233B2 | Power MOSFET device structure for high frequency applications | Electricity | 5 | Active |
| US7795108B2 | Resistance-based etch depth determination for SGT technology | Electricity | 4 | Active |
| US7521332B2 | Resistance-based etch depth determination for SGT technology | Electricity | 4 | Active |
| US7932148B2 | Processes for manufacturing MOSFET devices with excessive round-hole shielded gate trench (SGT) | Electricity | 4 | Active |
| US7683369B2 | Structure for measuring body pinch resistance of high density trench MOSFET array | Electricity | 3 | Active |
| US7492005B2 | Excessive round-hole shielded gate trench (SGT) MOSFET devices and manufacturing processes | Electricity | 3 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.