Inventor · Sunnyvale, CA, US

Tom Choi

21Patents
6h-index
43Co-inventors
69Inventor score

Filing activity: Mar 31, 2000 → Oct 19, 2021

Most-cited inventions

PatentTitleAreaCited byStatus
US9478433B1 Cyclic spacer etching process with improved profile control Electricity 106 Active
US10026621B2 SiN spacer profile patterning Electricity 93 Active
US6514378B1 Method for improving uniformity and reducing etch rate variation of etching polysilicon Electricity 21 Expired
US7782591B2 Methods of and apparatus for reducing amounts of particles on a wafer during wafer de-chucking Electricity 6 Active
US6531029B1 Vacuum plasma processor apparatus and method Electricity 6 Expired
US8906810B2 Pulsed dielectric etch process for in-situ metal hard mask shape control to enable void-free metallization Electricity 6 Active
US8283255B2 In-situ photoresist strip during plasma etching of active hard mask Electricity 3 Active
US10424487B2 Atomic layer etching processes Electricity 3 Active
US9818621B2 Cyclic oxide spacer etch process Electricity 2 Active
US9721807B2 Cyclic spacer etching process with improved profile control Electricity 2 Active
US10600639B2 SiN spacer profile patterning Electricity 1 Active
US10629473B2 Footing removal for nitride spacer Electricity 1 Active
US7479457B2 Gas mixture for removing photoresist and post etch residue from low-k dielectric material and method of use thereof Physics 1 Expired
US6897156B2 Vacuum plasma processor method Electricity 1 Expired
US10403507B2 Shaped etch profile with oxidation Electricity 1 Active
US10062575B2 Poly directional etch by oxidation Electricity 1 Active
US10354889B2 Non-halogen etching of silicon-containing materials Electricity 0 Active
US8912633B2 In-situ photoresist strip during plasma etching of active hard mask Electricity 0 Active
US10770269B2 Apparatus and methods for reducing particles in semiconductor process chambers Emerging Cross-Sectional Technologies 0 Active
US12374584B2 Multi color stack for self aligned dual pattern formation for multi purpose device structures Electricity 0 Active
US8124516B2 Trilayer resist organic layer etch Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.