Trace Hurd
17Patents
4h-index
25Co-inventors
60Inventor score
Filing activity: Aug 8, 2001 → Nov 23, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6787425B1 | Methods for fabricating transistor gate structures | Electricity | 20 | Expired |
| US6709875B2 | Contamination control for embedded ferroelectric device fabrication processes | Electricity | 11 | Expired |
| US7528072B2 | Crystallographic preferential etch to define a recessed-region for epitaxial growth | Electricity | 5 | Expired |
| US8049254B2 | Semiconductor device with gate-undercutting recessed region | Electricity | 4 | Active |
| US7195679B2 | Versatile system for wafer edge remediation | Emerging Cross-Sectional Technologies | 2 | Expired |
| US7323403B2 | Multi-step process for patterning a metal gate electrode | Electricity | 2 | Expired |
| US7371691B2 | Silicon recess improvement through improved post implant resist removal and cleans | Electricity | 2 | Expired |
| US7132365B2 | Treatment of silicon prior to nickel silicide formation | Electricity | 1 | Expired |
| US6995088B2 | Surface treatment of copper to improve interconnect formation | Electricity | 1 | Expired |
| US10886290B2 | Etching of silicon nitride and silica deposition control in 3D NAND structures | Electricity | 0 | Active |
| US7037823B2 | Method to reduce silanol and improve barrier properties in low k dielectric ic interconnects | Electricity | 0 | Expired |
| US12002687B2 | System and methods for wafer drying | Electricity | 0 | Active |
| US10844332B2 | Aqueous cleaning solution and method of protecting features on a substrate during etch residue removal | Chemistry; Metallurgy | 0 | Active |
| US7422969B2 | Multi-step process for patterning a metal gate electrode | Electricity | 0 | Active |
| US11376640B2 | Apparatus and method to electrostatically remove foreign matter from substrate surfaces | Electricity | 0 | Active |
| US11515178B2 | System and methods for wafer drying | Electricity | 0 | Active |
| US7732345B2 | Method for using a modified post-etch clean rinsing agent | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.