Inventor · Waterbury, CT, US

William Hunks

21Patents
8h-index
20Co-inventors
71Inventor score

Filing activity: Mar 12, 2007 → Jan 4, 2018

Most-cited inventions

PatentTitleAreaCited byStatus
US9337054B2 Precursors for silicon dioxide gap fill Electricity 426 Active
US7838329B2 Antimony and germanium complexes useful for CVD/ALD of metal thin films Electricity 41 Active
US8008117B2 Antimony and germanium complexes useful for CVD/ALD of metal thin films Electricity 14 Active
US9537095B2 Tellurium compounds useful for deposition of tellurium containing materials Chemistry; Metallurgy 12 Active
US8796068B2 Tellurium compounds useful for deposition of tellurium containing materials Chemistry; Metallurgy 12 Active
US8093140B2 Amorphous Ge/Te deposition process Emerging Cross-Sectional Technologies 10 Active
US8268665B2 Antimony and germanium complexes useful for CVD/ALD of metal thin films Electricity 9 Active
US8709863B2 Antimony and germanium complexes useful for CVD/ALD of metal thin films Electricity 9 Active
US8288198B2 Low temperature deposition of phase change memory materials Chemistry; Metallurgy 8 Active
US8877549B2 Low temperature deposition of phase change memory materials Chemistry; Metallurgy 5 Active
US9034688B2 Antimony compounds useful for deposition of antimony-containing materials Electricity 2 Active
US8674127B2 Antimony compounds useful for deposition of antimony-containing materials Electricity 1 Active
US9637395B2 Fluorine free tungsten ALD/CVD process Electricity 1 Active
US11476158B2 Cobalt deposition selectivity on copper and dielectrics Electricity 0 Active
US8679894B2 Low temperature deposition of phase change memory materials Chemistry; Metallurgy 0 Active
US9373677B2 Doping of ZrO2 for DRAM applications Electricity 0 Active
US9219232B2 Antimony and germanium complexes useful for CVD/ALD of metal thin films Electricity 0 Active
US10870921B2 Cyclopentadienyl titanium alkoxides with ozone activated ligands for ALD of TiO2 Electricity 0 Active
US9269582B2 Cluster ion implantation of arsenic and phosphorus Electricity 0 Active
US8053375B1 Super-dry reagent compositions for formation of ultra low k films Electricity 0 Active
US10043658B2 Precursors for silicon dioxide gap fill Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.