Advanced Ion Beam Technology, Inc.
78Patents
65Active
78Granted
52Portfolio score
Filing activity: Oct 12, 1999 → Jul 2, 2021 · 23 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7326941B2 | Apparatus and methods for ion beam implantation using ribbon and spot beams | Electricity | 29 | Expired |
| US8685825B2 | Replacement source/drain finFET fabrication | Electricity | 24 | Active |
| US6403967B1 | Magnet system for an ion beam implantation system using high perveance beams | Electricity | 21 | Expired |
| US6489622B1 | Apparatus for decelerating ion beams with minimal energy contamination | Electricity | 20 | Expired |
| US6946667B2 | Apparatus to decelerate and control ion beams to improve the total quality of ion implantation | Electricity | 17 | Expired |
| US6710358B1 | Apparatus and method for reducing energy contamination of low energy ion beams | Electricity | 16 | Expired |
| US6338775B1 | Apparatus and method for uniformly depositing thin films over substrates | Chemistry; Metallurgy | 15 | Expired |
| US6313428A | Apparatus and method for reducing space charge of ion beams and wafer charging | Electricity | 14 | Expired |
| US9450078B1 | Forming punch-through stopper regions in finFET devices | Electricity | 13 | Active |
| US7462843B2 | Apparatus and methods for ion beam implantation | Electricity | 9 | Expired |
| US8211784B2 | Method for manufacturing a semiconductor device with less leakage current induced by carbon implant | Electricity | 8 | Active |
| US9209278B2 | Replacement source/drain finFET fabrication | Electricity | 8 | Active |
| US6918351B2 | Apparatus for ion beam implantation | Electricity | 7 | Expired |
| US6806479B1 | Apparatus and method for reducing implant angle variations across a large wafer for a batch disk | Electricity | 7 | Expired |
| US8871584B2 | Replacement source/drain finFET fabrication | Electricity | 6 | Active |
| US7750323B1 | Ion implanter and method for implanting a wafer | Electricity | 5 | Active |
| US9281162B2 | Single bend energy filter for controlling deflection of charged particle beam | Electricity | 5 | Active |
| US8198610B2 | Ion implanter with variable aperture and ion implant method thereof | Electricity | 5 | Active |
| US6326746A | High efficiency resonator for linear accelerator | Electricity | 5 | Expired |
| US9159810B2 | Doping a non-planar semiconductor device | Electricity | 4 | Active |
| US8673753B1 | Multi-energy ion implantation | Electricity | 4 | Active |
| US9852887B2 | Ion source of an ion implanter | Electricity | 4 | Active |
| US7772571B2 | Implant beam utilization in an ion implanter | Electricity | 3 | Active |
| US8040124B2 | Method and apparatus for monitoring leakage current of a faraday cup | Electricity | 2 | Active |
| US9340870B2 | Magnetic field fluctuation for beam smoothing | Electricity | 2 | Active |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.