Bruce Beattie
22Patents
6h-index
27Co-inventors
69Inventor score
Filing activity: Feb 3, 1988 → Jan 11, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6124171A | Method of forming gate oxide having dual thickness by oxidation process | Emerging Cross-Sectional Technologies | 51 | Expired |
| US6087236A | Integrated circuit with multiple gate dielectric structures | Electricity | 43 | Expired |
| US6465358B1 | Post etch clean sequence for making a semiconductor device | Emerging Cross-Sectional Technologies | 29 | Expired |
| US5898968A | Accessory for cleaning golf club heads and golf balls | Emerging Cross-Sectional Technologies | 27 | Expired |
| US6597046B1 | Integrated circuit with multiple gate dielectric structures | Electricity | 16 | Expired |
| US9041106B2 | Three-dimensional germanium-based semiconductor devices formed on globally or locally isolated substrates | Electricity | 8 | Active |
| US4909185A | Cantilever and cold zone assembly for loading and unloading an oven | Emerging Cross-Sectional Technologies | 4 | Expired |
| US11342411B2 | Cavity spacer for nanowire transistors | Electricity | 4 | Active |
| US11404578B2 | Dielectric isolation layer between a nanowire transistor and a substrate | Electricity | 2 | Active |
| US9472399B2 | Three-dimensional germanium-based semiconductor devices formed on globally or locally isolated substrates | Electricity | 2 | Active |
| US11205715B2 | Self-aligned nanowire | Electricity | 1 | Active |
| US11894368B2 | Gate-all-around integrated circuit structures fabricated using alternate etch selective material | Electricity | 1 | Active |
| US11869891B2 | Non-planar integrated circuit structures having mitigated source or drain etch from replacement gate process | Electricity | 1 | Active |
| US11929396B2 | Cavity spacer for nanowire transistors | Electricity | 1 | Active |
| US11901458B2 | Dielectric isolation layer between a nanowire transistor and a substrate | Electricity | 0 | Active |
| US12302632B2 | Non-planar integrated circuit structures having mitigated source or drain etch from replacement gate process | Electricity | 0 | Active |
| US11069795B2 | Transistors with channel and sub-channel regions with distinct compositions and dimensions | Electricity | 0 | Active |
| US11869973B2 | Nanowire transistor structure and method of shaping | Electricity | 0 | Active |
| US11715787B2 | Self-aligned nanowire | Electricity | 0 | Active |
| US12349394B2 | Dielectric isolation layer between a nanowire transistor and a substrate | Electricity | 0 | Active |
| US11276691B2 | Gate-all-around integrated circuit structures having self-aligned source or drain undercut for varied widths | Electricity | 0 | Active |
| US12328905B2 | Cavity spacer for nanowire transistors | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.