Erwan Dornel
24Patents
3h-index
22Co-inventors
59Inventor score
Filing activity: Dec 20, 2007 → Jul 3, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9960205B2 | Optoelectronic device comprising light-emitting diodes | Electricity | 5 | Active |
| US9854632B2 | Optoelectronic circuit with low-flicker light-emitting diodes | Electricity | 4 | Active |
| US8236698B2 | Method for forming non-aligned microcavities of different depths | Performing Operations; Transporting | 3 | Active |
| US10923528B2 | Optoelectronic device comprising pixels with improved contrast and brightness | Electricity | 2 | Active |
| US8735959B2 | Non-volatile memory device formed by dual floating gate deposit | Electricity | 2 | Active |
| US10418506B2 | Light-emitting device with integrated light sensor | Electricity | 2 | Active |
| US7985632B2 | Method for forming microwires and/or nanowires | Emerging Cross-Sectional Technologies | 2 | Active |
| US11489088B2 | Method for manufacturing an optoelectronic device with self-aligning light confinement walls | Electricity | 2 | Active |
| US10153399B2 | Optoelectronic device comprising semiconductor elements and its fabrication process | Electricity | 1 | Active |
| US9876142B2 | Optoelectronic device comprising light-emitting diodes | Electricity | 1 | Active |
| US8988940B2 | Structure and method for narrowing voltage threshold distribution in non-volatile memories | Physics | 1 | Active |
| US8901654B1 | Semiconductor-on-insulator (SOI) field effect transistor with buried epitaxial active regions | Electricity | 1 | Active |
| US10411161B2 | Light-emitting device having a built-in light sensor | Electricity | 1 | Active |
| US10937777B2 | Opto-electronic device with light-emitting diodes | Electricity | 1 | Active |
| US8664059B2 | Non-volatile memory device formed by dual floating gate deposit | Electricity | 1 | Active |
| US11362137B2 | Optoelectronic device comprising a matrix of three-dimensional diodes | Electricity | 0 | Active |
| US8741704B2 | Metal oxide semiconductor (MOS) device with locally thickened gate oxide | Electricity | 0 | Active |
| US8252636B2 | Method of manufacturing nanowires parallel to the supporting substrate | Electricity | 0 | Active |
| US8928051B2 | Metal oxide semiconductor (MOS) device with locally thickened gate oxide | Electricity | 0 | Active |
| US11764196B2 | Optoelectronic device comprising light-emitting diodes | Electricity | 0 | Active |
| US11901482B2 | Method for manufacturing an optoelectronic device with self-aligning light confinement walls | Electricity | 0 | Active |
| US11769856B2 | Method for manufacturing an optoelectronic device with self-aligning light confinement walls | Electricity | 0 | Active |
| US9659781B2 | Method for forming a floating gate in a recess of a shallow trench isolation (STI) region | Electricity | 0 | Active |
| US11552126B2 | Optoelectronic device with electronic components at the level of the rear face of the substrate and manufacturing method | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.