Inventor · Freiberg, DE

Frank Habel

14Patents
2h-index
15Co-inventors
47Inventor score

Filing activity: May 5, 2006 → Apr 8, 2020

Most-cited inventions

PatentTitleAreaCited byStatus
US7727332B2 Process for selective masking of III-N layers and for the preparation of free-standing III-N layers or of devices, and products obtained thereby Electricity 258 Active
US8048224B2 Process for producing a III-N bulk crystal and a free-standing III-N substrate, and III-N bulk crystal and free-standing III-N substrate Emerging Cross-Sectional Technologies 2 Active
US7998273B2 Method for producing III-N layers, and III-N layers or III-N substrates, and devices based thereon Emerging Cross-Sectional Technologies 1 Active
US8778078B2 Process for the manufacture of a doped III-N bulk crystal and a free-standing III-N substrate, and doped III-N bulk crystal and free-standing III-N substrate as such Electricity 1 Active
US10309037B2 Method for producing III-N templates and the reprocessing thereof and III-N template Emerging Cross-Sectional Technologies 1 Active
US9074297B2 Method and device for manufacturing semiconductor compound materials by means of vapour phase epitaxy Emerging Cross-Sectional Technologies 1 Active
US10883191B2 Method for producing III-N templates and the reprocessing thereof and III-N template Emerging Cross-Sectional Technologies 0 Active
US10662549B2 Growth of A-B crystals without crystal lattice curvature Electricity 0 Active
US9461121B2 Process for the manufacture of a doped III-N bulk crystal and a free-standing III-N substrate, and doped III-N bulk crystal and free-standing III-N substrate as such Electricity 0 Active
US10584427B2 Processes for producing III-N single crystals, and III-N single crystal Emerging Cross-Sectional Technologies 0 Active
US9896779B2 Method for producing III-N single crystals, and III-N single crystal Emerging Cross-Sectional Technologies 0 Active
US12168839B2 Growth of A-B crystals without crystal lattice curvature Electricity 0 Active
US9115444B2 Method for producing III-N layers, and III-N layers or III-N substrates, and devices based thereon Emerging Cross-Sectional Technologies 0 Active
US9856579B2 Method and device for manufacturing semiconductor compound materials by means of vapour phase epitaxy Emerging Cross-Sectional Technologies 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.