Inventor · Newark, DE, US

George C. Jacob

33Patents
3h-index
49Co-inventors
59Inventor score

Filing activity: Jul 28, 2008 → Jun 10, 2019

Most-cited inventions

PatentTitleAreaCited byStatus
US9484212B1 Chemical mechanical polishing method Electricity 5 Active
US8829101B2 Windmill propeller blade and method of making same Emerging Cross-Sectional Technologies 4 Active
US9925637B2 Tapered poromeric polishing pad Performing Operations; Transporting 3 Active
US8742018B2 High Tg epoxy systems for composite applications Chemistry; Metallurgy 3 Active
US9206349B2 Powder coated proppant and method of making the same Chemistry; Metallurgy 3 Active
US9475168B2 Polishing pad window Performing Operations; Transporting 2 Active
US10259099B2 Tapering method for poromeric polishing pad Performing Operations; Transporting 2 Active
US10106662B2 Thermoplastic poromeric polishing pad Chemistry; Metallurgy 2 Active
US10569384B1 Chemical mechanical polishing pad and polishing method Electricity 2 Active
US10086494B2 High planarization efficiency chemical mechanical polishing pads and methods of making Performing Operations; Transporting 1 Active
US9586304B2 Controlled-expansion CMP PAD casting method Chemistry; Metallurgy 1 Active
US11285577B2 Thin film fluoropolymer composite CMP polishing method Chemistry; Metallurgy 1 Active
US10391606B2 Chemical mechanical polishing pads for improved removal rate and planarization Performing Operations; Transporting 1 Active
US10464187B2 High removal rate chemical mechanical polishing pads from amine initiated polyol containing curatives Performing Operations; Transporting 1 Active
US10293456B2 Aliphatic polyurethane optical endpoint detection windows and CMP polishing pads containing them Electricity 1 Active
US9630293B2 Chemical mechanical polishing pad composite polishing layer formulation Electricity 1 Active
US9452507B2 Controlled-viscosity CMP casting method Chemistry; Metallurgy 1 Active
US10464188B1 Chemical mechanical polishing pad and polishing method Chemistry; Metallurgy 1 Active
US11638978B2 Low-debris fluopolymer composite CMP polishing pad Electricity 0 Active
US10144115B2 Method of making polishing layer for chemical mechanical polishing pad Performing Operations; Transporting 0 Active
US10105825B2 Method of making polishing layer for chemical mechanical polishing pad Performing Operations; Transporting 0 Active
US9315664B2 High Tg epoxy systems for composite applications Chemistry; Metallurgy 0 Active
US11491605B2 Fluopolymer composite CMP polishing method Electricity 0 Active
US9388311B2 Amphiphilic block copolymers and inorganic nanofillers to enhance performance of thermosetting polymers Chemistry; Metallurgy 0 Active
US11524390B2 Methods of making chemical mechanical polishing layers having improved uniformity Performing Operations; Transporting 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.