Joerg Siegert
16Patents
2h-index
18Co-inventors
43Inventor score
Filing activity: Apr 5, 2013 → May 9, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9852955B2 | Method and arrangement for analyzing a semiconductor element and method for manufacturing a semiconductor component | Electricity | 4 | Active |
| US9753218B2 | Semiconductor device with integrated mirror and method of producing a semiconductor device with integrated mirror | Physics | 3 | Active |
| US10283541B2 | Semiconductor device comprising an aperture array and method of producing such a semiconductor device | Electricity | 2 | Active |
| US11107848B2 | Semiconductor device for detection of radiation and method of producing a semiconductor device for detection of radiation | Electricity | 2 | Active |
| US9929035B2 | Method of producing a removable wafer connection and carrier for wafer support | Emerging Cross-Sectional Technologies | 1 | Active |
| US10684412B2 | Semiconductor device with photonic and electronic functionality and method for manufacturing a semiconductor device | Electricity | 0 | Active |
| US12100644B2 | Semiconductor device with through-substrate via and method of manufacturing a semiconductor device with through-substrate via | Electricity | 0 | Active |
| US9608035B2 | Method of wafer-scale integration of semiconductor devices and semiconductor device | Electricity | 0 | Active |
| US11271134B2 | Method for manufacturing an optical sensor and optical sensor | Electricity | 0 | Active |
| US10332931B2 | Semiconductor device for wafer-scale integration | Electricity | 0 | Active |
| US11313749B2 | Pressure sensor device and method for forming a pressure sensor device | Physics | 0 | Active |
| US9991177B2 | Method and arrangement for analyzing a semiconductor element and method for manufacturing a semiconductor component | Electricity | 0 | Active |
| US11572271B2 | Method for manufacturing an etch stop layer and MEMS sensor comprising an etch stop layer | Performing Operations; Transporting | 0 | Active |
| US11535512B2 | Method for manufacturing an etch stop layer and MEMS sensor comprising an etch stop layer | General | 0 | Revoked |
| US11697201B2 | Exoskeleton system, control device, and method | Physics | 0 | Active |
| US10644047B2 | Optoelectronic device with a refractive element and a method of producing such an optoelectronic device | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.