Jong Shik Yoon
14Patents
6h-index
28Co-inventors
62Inventor score
Filing activity: Jul 27, 2004 → Sep 3, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8952452B2 | Semiconductor devices and method of manufacturing the same | Electricity | 13 | Active |
| US7098099B1 | Semiconductor device having optimized shallow junction geometries and method for fabrication thereof | Electricity | 12 | Expired |
| US9922979B2 | Integrated circuit device and method of manufacturing the same | Electricity | 11 | Active |
| US7045436B2 | Method to engineer the inverse narrow width effect (INWE) in CMOS technology using shallow trench isolation (STI) | Electricity | 9 | Expired |
| US9209177B2 | Semiconductor devices including gates and dummy gates of different materials | Electricity | 9 | Active |
| US7018888B2 | Method for manufacturing improved sidewall structures for use in semiconductor devices | Electricity | 9 | Expired |
| US7229869B2 | Method for manufacturing a semiconductor device using a sidewall spacer etchback | Electricity | 6 | Expired |
| US7514331B2 | Method of manufacturing gate sidewalls that avoids recessing | Electricity | 3 | Active |
| US9412693B2 | Semiconductor device having jumper pattern and blocking pattern | Electricity | 3 | Active |
| US7795085B2 | Intentional pocket shadowing to compensate for the effects of cross-diffusion in SRAMs | Electricity | 2 | Active |
| US9425148B2 | Semiconductor devices having contacts with intervening spacers and method for fabricating the same | Electricity | 0 | Active |
| US9754789B2 | Method of fabricating semiconductor device and computing system for implementing the method | Electricity | 0 | Active |
| US12356697B2 | Integrated circuit device and method of manufacturing the same | Electricity | 0 | Active |
| US7811893B2 | Shallow trench isolation stress adjuster for MOS transistor | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.