Jun Zeng
125Patents
18h-index
68Co-inventors
89Inventor score
Filing activity: Mar 13, 1987 → Jun 25, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6188105A | High density MOS-gated power device and process for forming same | Electricity | 139 | Expired |
| US6683346B2 | Ultra dense trench-gated power-device with the reduced drain-source feedback capacitance and Miller charge | Electricity | 120 | Expired |
| US8076719B2 | Semiconductor device structures and related processes | Electricity | 116 | Active |
| US6351009B1 | MOS-gated device having a buried gate and process for forming same | Electricity | 53 | Expired |
| US8704295B1 | Schottky and MOSFET+Schottky structures, devices, and methods | Electricity | 46 | Active |
| US6121089A | Methods of forming power semiconductor devices having merged split-well body regions therein | Electricity | 43 | Expired |
| US8486941B2 | Phenyl amino pyrimidine compounds and uses thereof | Chemistry; Metallurgy | 42 | Active |
| US8319278B1 | Power device structures and methods using empty space zones | Electricity | 37 | Active |
| US6246090A | Power trench transistor device source region formation using silicon spacer | Electricity | 32 | Expired |
| US6638826B2 | Power MOS device with buried gate | Electricity | 30 | Expired |
| US9093522B1 | Vertical power MOSFET with planar channel and vertical field plate | Electricity | 29 | Active |
| US6784505B2 | Low voltage high density trench-gated power device with uniformly doped channel and its edge termination technique | Electricity | 28 | Expired |
| US6362026B1 | Edge termination for silicon power devices | Emerging Cross-Sectional Technologies | 26 | Expired |
| US6104062A | Semiconductor device having reduced effective substrate resistivity and associated methods | Electricity | 24 | Expired |
| US6921939B2 | Power MOSFET and method for forming same using a self-aligned body implant | Emerging Cross-Sectional Technologies | 23 | Expired |
| US6445035B1 | Power MOS device with buried gate and groove | Electricity | 23 | Expired |
| US10353616B1 | Managing data relocation in storage systems | Physics | 22 | Active |
| US6373098B1 | Trench-gated device having trench walls formed by selective epitaxial growth and process for forming device | Electricity | 21 | Expired |
| US7910439B2 | Super self-aligned trench MOSFET devices, methods, and systems | Electricity | 17 | Active |
| US7105228B2 | Method for making shaped structures with internally coated cavities | Emerging Cross-Sectional Technologies | 15 | Expired |
| US9227189B2 | Microfluidic liquid stream configuration system | Performing Operations; Transporting | 15 | Active |
| US6946348B2 | Low voltage high density trench-gated power device with uniformity doped channel and its edge termination technique | Electricity | 15 | Expired |
| US6242784A | Edge termination for silicon power devices | Emerging Cross-Sectional Technologies | 15 | Expired |
| US8390060B2 | Power semiconductor devices, structures, and related methods | Electricity | 14 | Active |
| US6455379B2 | Power trench transistor device source region formation using silicon spacer | Electricity | 12 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.