Markus Kuhn
33Patents
10h-index
59Co-inventors
78Inventor score
Filing activity: Jan 28, 1999 → Jun 29, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8211772B2 | Two-dimensional condensation for uniaxially strained semiconductor fins | Electricity | 60 | Active |
| US6689675B1 | Method for making a semiconductor device having a high-k gate dielectric | Electricity | 50 | Expired |
| US7074680B2 | Method for making a semiconductor device having a high-k gate dielectric | Electricity | 48 | Expired |
| US6890807B2 | Method for making a semiconductor device having a metal gate electrode | Electricity | 37 | Expired |
| US6787440B2 | Method for making a semiconductor device having an ultra-thin high-k gate dielectric | Electricity | 17 | Expired |
| US8269283B2 | Methods and apparatus to reduce layout based strain variations in non-planar transistor structures | Electricity | 15 | Active |
| US7727892B2 | Method and apparatus for forming metal-metal oxide etch stop/barrier for integrated circuit interconnects | Electricity | 14 | Expired |
| US8992582B1 | Fixation devices and method | Human Necessities | 11 | Active |
| US6721423B1 | Lost cost countermeasures against compromising electromagnetic computer emanations | Physics | 11 | Expired |
| US8558279B2 | Non-planar device having uniaxially strained semiconductor body and method of making same | Electricity | 11 | Active |
| US8487348B2 | Methods and apparatus to reduce layout based strain variations in non-planar transistor structures | Electricity | 7 | Active |
| US7084038B2 | Method for making a semiconductor device having a high-k gate dielectric | Electricity | 7 | Expired |
| US6794755B2 | Surface alteration of metal interconnect in integrated circuits for electromigration and adhesion improvement | Electricity | 6 | Expired |
| US7339271B2 | Metal-metal oxide etch stop/barrier for integrated circuit interconnects | Electricity | 6 | Expired |
| US7122870B2 | Methods of forming a multilayer stack alloy for work function engineering | Electricity | 5 | Expired |
| US6849509B2 | Methods of forming a multilayer stack alloy for work function engineering | Electricity | 5 | Expired |
| US9711598B2 | Two-dimensional condensation for uniaxially strained semiconductor fins | Electricity | 3 | Active |
| US9159835B2 | Two-dimensional condensation for uniaxially strained semiconductor fins | Electricity | 3 | Active |
| US8551555B2 | Biocompatible coatings for medical devices | Performing Operations; Transporting | 3 | Active |
| US7420254B2 | Semiconductor device having a metal gate electrode | Electricity | 2 | Expired |
| US10463411B2 | Surgical retaining instruments for bone plates | Performing Operations; Transporting | 2 | Active |
| US7442983B2 | Method for making a semiconductor device having a high-k gate dielectric | Electricity | 2 | Expired |
| US7192890B2 | Depositing an oxide | Electricity | 2 | Expired |
| US8299617B2 | Method and apparatus for forming metal-metal oxide etch stop/barrier for integrated circuit interconnects | Electricity | 1 | Active |
| US10400801B2 | Compact unit | Mechanical Engineering; Lighting; Heating | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.