Marty W. DeGroot
34Patents
7h-index
60Co-inventors
64Inventor score
Filing activity: Jan 12, 2011 → May 17, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9147788B2 | Photovoltaic cell assembly | Emerging Cross-Sectional Technologies | 38 | Active |
| US9259820B2 | Chemical mechanical polishing pad with polishing layer and window | Electricity | 32 | Active |
| US9259821B2 | Chemical mechanical polishing layer formulation with conditioning tolerance | Electricity | 29 | Active |
| US9314897B2 | Chemical mechanical polishing pad with endpoint detection window | Electricity | 28 | Active |
| US9333620B2 | Chemical mechanical polishing pad with clear endpoint detection window | Electricity | 28 | Active |
| US8980749B1 | Method for chemical mechanical polishing silicon wafers | Performing Operations; Transporting | 17 | Active |
| US9064806B1 | Soft and conditionable chemical mechanical polishing pad with window | Emerging Cross-Sectional Technologies | 7 | Active |
| US9484212B1 | Chemical mechanical polishing method | Electricity | 5 | Active |
| US9144880B2 | Soft and conditionable chemical mechanical polishing pad | Chemistry; Metallurgy | 4 | Active |
| US9102034B2 | Method of chemical mechanical polishing a substrate | Electricity | 3 | Active |
| US9238295B2 | Soft and conditionable chemical mechanical window polishing pad | Chemistry; Metallurgy | 2 | Active |
| US8921148B2 | Moisture resistant photovoltaic devices with exposed conductive grid | Emerging Cross-Sectional Technologies | 2 | Active |
| US9065008B2 | Automated assembly method for the production of interconnected thin film solar cell modules | Emerging Cross-Sectional Technologies | 2 | Active |
| US9233451B2 | Soft and conditionable chemical mechanical polishing pad stack | Chemistry; Metallurgy | 1 | Active |
| US9216489B2 | Chemical mechanical polishing pad with endpoint detection window | Emerging Cross-Sectional Technologies | 1 | Active |
| US9238296B2 | Multilayer chemical mechanical polishing pad stack with soft and conditionable polishing layer | Chemistry; Metallurgy | 1 | Active |
| US10464187B2 | High removal rate chemical mechanical polishing pads from amine initiated polyol containing curatives | Performing Operations; Transporting | 1 | Active |
| US10722999B2 | High removal rate chemical mechanical polishing pads and methods of making | Chemistry; Metallurgy | 0 | Active |
| US8604336B2 | Photovoltaic device with transparent, conductive barrier layer | Emerging Cross-Sectional Technologies | 0 | Active |
| US9446497B2 | Broad spectrum, endpoint detection monophase olefin copolymer window with specific composition in multilayer chemical mechanical polishing pad | Performing Operations; Transporting | 0 | Active |
| US10105825B2 | Method of making polishing layer for chemical mechanical polishing pad | Performing Operations; Transporting | 0 | Active |
| US11396081B2 | Chemical mechanical polishing pad | Electricity | 0 | Active |
| US9059349B2 | Moisture resistant photovoltaic devices with improved adhesion of barrier film | Emerging Cross-Sectional Technologies | 0 | Active |
| US9776300B2 | Chemical mechanical polishing pad and method of making same | Performing Operations; Transporting | 0 | Active |
| US9586305B2 | Chemical mechanical polishing pad and method of making same | Emerging Cross-Sectional Technologies | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.