Inventor · Hitachinaka, JP

Masashi Sahara

34Patents
9h-index
50Co-inventors
78Inventor score

Filing activity: Jan 11, 1996 → Dec 20, 2019

Most-cited inventions

PatentTitleAreaCited byStatus
US5904556A Method for making semiconductor integrated circuit device having interconnection structure using tungsten film Electricity 40 Expired
US6897570B2 Semiconductor device and method of manufacturing same Electricity 29 Expired
US7102223B1 Semiconductor device and a method of manufacturing the same Electricity 25 Expired
US6031288A Semiconductor integrated circuit device for connecting semiconductor region and electrical wiring metal via titanium silicide layer and method of fabrication thereof Electricity 25 Expired
US6429476B2 Semiconductor integrated circuit device Electricity 16 Expired
US7759804B2 Semiconductor device and a method of manufacturing the same Electricity 15 Active
US6780757B2 Semiconductor integrated circuit device and method for making the same Electricity 12 Expired
US7504297B2 Semiconductor device and a method of manufacturing the same Electricity 11 Active
US7342302B2 Semiconductor device and a method of manufacturing the same Electricity 9 Active
US6503803B2 Method of fabricating a semiconductor integrated circuit device for connecting semiconductor region and electrical wiring metal via titanium silicide layer Electricity 8 Expired
US6472754B2 Semiconductor device with improved arrangements to avoid breakage of tungsten interconnector Electricity 7 Expired
US8183691B2 Semiconductor device with pads overlapping wiring layers including dummy wiring Electricity 6 Active
US7615848B2 Semiconductor device and a method of manufacturing the same Electricity 5 Active
US7189637B2 Method of manufacturing a semiconductor device having a multi-layered wiring structure Electricity 5 Expired
US7705462B2 Semiconductor device and a method of manufacturing the same Electricity 5 Active
US7303986B2 Semiconductor device and a method of manufacturing the same Electricity 4 Active
US7400046B2 Semiconductor device with guard rings that are formed in each of the plural wiring layers Electricity 4 Active
US6268658A Semiconductor integrated circuit device for connecting semiconductor region and electrical wiring metal via titanium silicide layer and method of fabrication thereof Electricity 4 Expired
US7064437B2 Semiconductor device having aluminum conductors Electricity 3 Expired
US6300237A Semiconductor integrated circuit device and method for making the same Electricity 2 Expired
US6476492B2 Semiconductor device having a capacitor and an interconnect layer with molybdenum-containing tungsten Electricity 2 Expired
US6856021B1 Semiconductor device having aluminum alloy conductors Electricity 2 Expired
US6583049B2 Semiconductor integrated circuit device and method for making the same Electricity 2 Expired
US6617691B2 Semiconductor device Electricity 2 Expired
US6548904B2 Semiconductor device having a capacitor and a metal interconnect layer with tungsten as a main constituent material and containing molybdenum Electricity 2 Expired

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.