Pan-Kwi Park
27Patents
4h-index
48Co-inventors
59Inventor score
Filing activity: Mar 10, 2009 → May 10, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7704867B2 | Method of manufacturing semiconductor devices | Electricity | 9 | Active |
| US9129952B2 | Semiconductor devices including a stressor in a recess and methods of forming the same | Electricity | 6 | Active |
| US9257520B2 | Semiconductor devices including a stressor in a recess and methods of forming the same | Electricity | 5 | Active |
| US8907426B2 | Semiconductor device having embedded strain-inducing pattern and method of forming the same | Electricity | 5 | Active |
| US9502563B2 | Semiconductor device having embedded strain-inducing pattern and method of forming the same | Electricity | 4 | Active |
| US9985036B2 | Semiconductor device having embedded strain-inducing pattern and method of forming the same | Electricity | 4 | Active |
| US9768300B2 | Semiconductor devices including a stressor in a recess and methods of forming the same | Electricity | 4 | Active |
| US8502286B2 | Etch stop layers and methods of forming the same | Electricity | 3 | Active |
| US8227308B2 | Method of fabricating semiconductor integrated circuit device | Electricity | 1 | Active |
| US10312152B2 | Field effect transistor with stacked nanowire-like channels and methods of manufacturing the same | Electricity | 1 | Active |
| US7977257B2 | Methods of manufacturing semiconductor devices | Electricity | 1 | Active |
| US12021131B2 | Semiconductor device | Performing Operations; Transporting | 1 | Active |
| US8951853B1 | Method of forming semiconductor device using Si-H rich silicon nitride layer | Electricity | 1 | Active |
| US9548301B2 | Semiconductor devices including a stressor in a recess and methods of forming the same | Electricity | 0 | Active |
| US12142690B2 | Semiconductor devices | Electricity | 0 | Active |
| US8772173B2 | Method of manufacturing semiconductor device | Electricity | 0 | Active |
| US11990552B2 | Semiconductor devices | Electricity | 0 | Active |
| US12402400B2 | Multi gate semiconductor device | Electricity | 0 | Active |
| US9024385B2 | Semiconductor devices including a stressor in a recess and methods of forming the same | General | 0 | Revoked |
| US12289908B2 | Semiconductor device having multi-bridge channel field-effect transistor including source/drain pattern with a plurality of semiconductor patterns | Performing Operations; Transporting | 0 | Active |
| US12040402B2 | Semiconductor device | Electricity | 0 | Active |
| US11821106B2 | Semiconductor process chamber including lower volume upper dome | Electricity | 0 | Active |
| US10790133B2 | Precleaning apparatus and substrate processing system | Electricity | 0 | Active |
| US9324834B2 | Semiconductor device having embedded strain-inducing pattern and method of forming the same | Electricity | 0 | Active |
| US9583592B2 | Methods of manufacturing semiconductor devices | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.