Pragati Kumar
54Patents
9h-index
19Co-inventors
71Inventor score
Filing activity: Apr 21, 1999 → May 26, 2015
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8144498B2 | Resistive-switching nonvolatile memory elements | Physics | 101 | Active |
| US8143092B2 | Methods for forming resistive switching memory elements by heating deposited layers | Electricity | 88 | Active |
| US8294219B2 | Nonvolatile memory element including resistive switching metal oxide layers | Electricity | 31 | Active |
| US8129704B2 | Non-volatile resistive-switching memories | Electricity | 14 | Active |
| US7863087B1 | Methods for forming resistive-switching metal oxides for nonvolatile memory elements | Electricity | 13 | Active |
| US8318572B1 | Inexpensive electrode materials to facilitate rutile phase titanium oxide | Electricity | 12 | Active |
| US8053364B2 | Closed-loop sputtering controlled to enhance electrical characteristics in deposited layer | Electricity | 12 | Active |
| US8008096B2 | ALD processing techniques for forming non-volatile resistive-switching memories | Electricity | 11 | Active |
| US8415657B2 | Enhanced work function layer supporting growth of rutile phase titanium oxide | Electricity | 9 | Active |
| US8551809B2 | Reduction of forming voltage in semiconductor devices | Electricity | 9 | Active |
| US6407022B1 | Method for fabricating shaped monolithic ceramics | Emerging Cross-Sectional Technologies | 8 | Expired |
| US8278735B2 | Yttrium and titanium high-k dielectric films | Electricity | 6 | Active |
| US8354702B1 | Inexpensive electrode materials to facilitate rutile phase titanium oxide | Electricity | 5 | Active |
| US7968452B2 | Titanium-based high-K dielectric films | Emerging Cross-Sectional Technologies | 5 | Active |
| US9362497B2 | Reduction of forming voltage in semiconductor devices | Electricity | 5 | Active |
| US7977153B2 | Methods for forming resistive-switching metal oxides for nonvolatile memory elements | Electricity | 4 | Active |
| US8828821B2 | Fabrication of semiconductor stacks with ruthenium-based materials | Electricity | 4 | Active |
| US8737036B2 | Titanium based high-K dielectric films | Emerging Cross-Sectional Technologies | 3 | Active |
| US8963117B2 | Reduction of forming voltage in semiconductor devices | Electricity | 3 | Active |
| US9070867B2 | Non-volatile resistive-switching memories | Electricity | 3 | Active |
| US8481384B2 | Method for producing MIM capacitors with high K dielectric materials and non-noble electrodes | Electricity | 3 | Active |
| US8873276B2 | Resistive-switching nonvolatile memory elements | Physics | 3 | Active |
| US8921156B2 | Non-volatile resistive-switching memories | Electricity | 3 | Active |
| US8367463B2 | Methods for forming resistive-switching metal oxides for nonvolatile memory elements | Electricity | 3 | Active |
| US8574956B2 | Method of forming non-volatile resistive-switching memories | Electricity | 3 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.