Inventor · Pleasanton, CA, US

Qian Fu

59Patents
7h-index
78Co-inventors
71Inventor score

Filing activity: Sep 30, 2005 → Feb 1, 2024

Most-cited inventions

PatentTitleAreaCited byStatus
US9583357B1 Systems and methods for reverse pulsing Electricity 90 Active
US9761459B2 Systems and methods for reverse pulsing Electricity 85 Active
US8609546B2 Pulsed bias plasma process to control microloading Electricity 22 Active
US9991128B2 Atomic layer etching in continuous plasma Electricity 21 Active
US8329051B2 Method for forming stair-step structures Electricity 14 Active
US8901004B2 Plasma etch method to reduce micro-loading Electricity 11 Active
US9741563B2 Hybrid stair-step etch Electricity 9 Active
US7629255B2 Method for reducing microloading in etching high aspect ratio structures Electricity 6 Active
US8518282B2 Method of controlling etch microloading for a tungsten-containing layer Electricity 5 Active
US8753804B2 Line width roughness improvement with noble gas plasma Electricity 5 Active
US10446394B2 Spacer profile control using atomic layer deposition in a multiple patterning process Electricity 5 Active
US8440573B2 Method and apparatus for pattern collapse free wet processing of semiconductor devices Electricity 4 Active
US9275872B2 Method for forming stair-step structures Electricity 3 Active
US9263284B2 Line width roughness improvement with noble gas plasma Electricity 3 Active
US9466502B2 Line width roughness improvement with noble gas plasma Electricity 3 Active
US8535549B2 Method for forming stair-step structures Electricity 3 Active
US9633867B2 Method and apparatus for anisotropic tungsten etching Electricity 3 Active
US9824896B2 Methods and systems for advanced ion control for etching processes Emerging Cross-Sectional Technologies 3 Active
US9129902B2 Continuous plasma ETCH process Electricity 2 Active
US9767991B2 Methods and systems for independent control of radical density, ion density, and ion energy in pulsed plasma semiconductor device fabrication Electricity 2 Active
US10658194B2 Silicon-based deposition for semiconductor processing Electricity 2 Active
US7682979B2 Phase change alloy etch Electricity 2 Active
US10354888B2 Method and apparatus for anisotropic tungsten etching Electricity 2 Active
US8431461B1 Silicon nitride dry trim without top pulldown Electricity 1 Active
US9646844B2 Method for forming stair-step structures Electricity 1 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.