Radu Barsan
17Patents
11h-index
6Co-inventors
61Inventor score
Filing activity: May 23, 1995 → May 26, 2010
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5587945A | CMOS EEPROM cell with tunneling window in the read path | Physics | 98 | Expired |
| US5646901A | CMOS memory cell with tunneling during program and erase through the NMOS and PMOS transistors and a pass gate separating the NMOS and PMOS transistors | Physics | 86 | Expired |
| US5672521A | Method of forming multiple gate oxide thicknesses on a wafer substrate | Emerging Cross-Sectional Technologies | 65 | Expired |
| US5942780A | Integrated circuit having, and process providing, different oxide layer thicknesses on a substrate | Electricity | 46 | Expired |
| US5959336A | Decoder circuit with short channel depletion transistors | Emerging Cross-Sectional Technologies | 42 | Expired |
| US5854114A | Data retention of EEPROM cell with shallow trench isolation using thicker liner oxide | Electricity | 38 | Expired |
| US5615150A | Control gate-addressed CMOS non-volatile cell that programs through gates of CMOS transistors | Physics | 29 | Expired |
| US6071784A | Annealing of silicon oxynitride and silicon nitride films to eliminate high temperature charge loss | Electricity | 28 | Expired |
| US5761116A | V.sub.pp only scalable EEPROM memory cell having transistors with thin tunnel gate oxide | Physics | 28 | Expired |
| US5594687A | Completely complementary MOS memory cell with tunneling through the NMOS and PMOS transistors during program and erase | Physics | 16 | Expired |
| US6064105A | Data retention of EEPROM cell with shallow trench isolation using thicker liner oxide | Electricity | 16 | Expired |
| US5830795A | Simplified masking process for programmable logic device manufacture | Electricity | 10 | Expired |
| US5700698A | Method for screening non-volatile memory and programmable logic devices | Physics | 6 | Expired |
| US5908308A | Use of borophosphorous tetraethyl orthosilicate (BPTEOS) to improve isolation in a transistor array | Electricity | 5 | Expired |
| US6211022A | Field leakage by using a thin layer of nitride deposited by chemical vapor deposition | Electricity | 2 | Expired |
| US5841701A | Method of charging and discharging floating gage transistors to reduce leakage current | Physics | 1 | Expired |
| US8358889B2 | Device fabrication with planar bragg gratings suppressing parasitic effects | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.