Inventor · Los Gatos, CA, US

Richard Wise

35Patents
11h-index
50Co-inventors
78Inventor score

Filing activity: Feb 26, 1998 → Oct 5, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US9824893B1 Tin oxide thin film spacers in semiconductor device manufacturing Electricity 413 Active
US10197908B2 Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework Physics 21 Active
US10546748B2 Tin oxide films in semiconductor device manufacturing Electricity 19 Active
US11031245B2 Tin oxide thin film spacers in semiconductor device manufacturing Electricity 16 Active
US10796912B2 Eliminating yield impact of stochastics in lithography Electricity 15 Active
US10269566B2 Etching substrates using ale and selective deposition Electricity 14 Active
US11183383B2 Tin oxide thin film spacers in semiconductor device manufacturing Electricity 13 Active
US11257674B2 Eliminating yield impact of stochastics in lithography Electricity 12 Active
US10534257B2 Layout pattern proximity correction through edge placement error prediction Electricity 12 Active
US11355353B2 Tin oxide mandrels in patterning Electricity 12 Active
US11322351B2 Tin oxide films in semiconductor device manufacturing Electricity 11 Active
US6093281A Baffle plate design for decreasing conductance lost during precipitation of polymer precursors in plasma etching chambers Electricity 9 Expired
US7030008B2 Techniques for patterning features in semiconductor devices Emerging Cross-Sectional Technologies 9 Expired
US9984858B2 ALE smoothness: in and outside semiconductor industry Electricity 8 Active
US10585347B2 Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework Physics 8 Active
US10685836B2 Etching substrates using ALE and selective deposition Electricity 8 Active
US11784047B2 Tin oxide thin film spacers in semiconductor device manufacturing Electricity 7 Active
US6686296B1 Nitrogen-based highly polymerizing plasma process for etching of organic materials in semiconductor manufacturing Electricity 6 Expired
US9922839B2 Low roughness EUV lithography Electricity 5 Active
US10304659B2 Ale smoothness: in and outside semiconductor industry Electricity 4 Active
US10438807B2 Low roughness EUV lithography Electricity 3 Active
US7545041B2 Techniques for patterning features in semiconductor devices Emerging Cross-Sectional Technologies 3 Active
US12051589B2 Tin oxide thin film spacers in semiconductor device manufacturing Electricity 3 Active
US11987876B2 Chamfer-less via integration scheme Electricity 3 Active
US12183604B2 Integrated dry processes for patterning radiation photoresist patterning Electricity 2 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.