Timothy J. Dalton
175Patents
25h-index
220Co-inventors
93Inventor score
Filing activity: May 28, 1993 → Sep 16, 2014
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6153935A | Dual etch stop/diffusion barrier for damascene interconnects | Electricity | 315 | Expired |
| US6551924B1 | Post metalization chem-mech polishing dielectric etch | Electricity | 235 | Expired |
| US5450205A | Apparatus and method for real-time measurement of thin film layer thickness and changes thereof | Physics | 207 | Expired |
| US7193423B1 | Wafer-to-wafer alignments | Electricity | 204 | Expired |
| US7045453B2 | Very low effective dielectric constant interconnect structures and methods for fabricating the same | Electricity | 199 | Expired |
| US7023093B2 | Very low effective dielectric constant interconnect Structures and methods for fabricating the same | Electricity | 104 | Expired |
| US6635506B2 | Method of fabricating micro-electromechanical switches on CMOS compatible substrates | Performing Operations; Transporting | 83 | Expired |
| US6451712B1 | Method for forming a porous dielectric material layer in a semiconductor device and device formed | Electricity | 71 | Expired |
| US6358832B1 | Method of forming barrier layers for damascene interconnects | Electricity | 68 | Expired |
| US6649531B2 | Process for forming a damascene structure | Electricity | 60 | Expired |
| US6815329B2 | Multilayer interconnect structure containing air gaps and method for making | Electricity | 58 | Expired |
| US9201041B2 | Extended gate sensor for pH sensing | Physics | 55 | Active |
| US6975032B2 | Copper recess process with application to selective capping and electroless plating | Electricity | 51 | Expired |
| US7361991B2 | Closed air gap interconnect structure | Electricity | 48 | Expired |
| US7394332B2 | Micro-cavity MEMS device and method of fabricating same | Emerging Cross-Sectional Technologies | 45 | Expired |
| US7531407B2 | Semiconductor integrated circuit devices having high-Q wafer backside inductors and methods of fabricating same | Electricity | 43 | Active |
| US6617690B1 | Interconnect structures containing stress adjustment cap layer | Electricity | 40 | Expired |
| US8024012B2 | Intelligent wireless power charging system | Electricity | 30 | Active |
| US7670921B2 | Structure and method for self aligned vertical plate capacitor | Electricity | 29 | Active |
| US7365001B2 | Interconnect structures and methods of making thereof | Electricity | 27 | Expired |
| US6720249B1 | Protective hardmask for producing interconnect structures | Electricity | 27 | Expired |
| US7514271B2 | Method of forming high density planar magnetic domain wall memory | Emerging Cross-Sectional Technologies | 26 | Active |
| US6838355B1 | Damascene interconnect structures including etchback for low-k dielectric materials | Electricity | 26 | Expired |
| US7282148B2 | Porous silicon composite structure as large filtration array | Performing Operations; Transporting | 25 | Expired |
| US7657995B2 | Method of fabricating a microelectromechanical system (MEMS) switch | Emerging Cross-Sectional Technologies | 25 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.