Vito Dai
16Patents
6h-index
19Co-inventors
59Inventor score
Filing activity: Dec 19, 2006 → Dec 31, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8898606B1 | Layout pattern correction for integrated circuits | Physics | 12 | Active |
| US8555215B2 | Methods for decomposing circuit design layouts and for fabricating semiconductor devices using decomposed patterns | Physics | 7 | Active |
| US7757190B2 | Design rules checking augmented with pattern matching | Emerging Cross-Sectional Technologies | 7 | Active |
| US9081919B2 | Design-for-manufacturing—design-enabled-manufacturing (DFM-DEM) proactive integrated manufacturing flow | Physics | 7 | Active |
| US8418105B1 | Methods for pattern matching in a double patterning technology-compliant physical design flow | Physics | 7 | Active |
| US9012270B2 | Metal layer enabling directed self-assembly semiconductor layout designs | Electricity | 6 | Active |
| US8453089B2 | Method and apparatus for pattern adjusted timing via pattern matching | Physics | 4 | Active |
| US8924896B2 | Automated design layout pattern correction based on context-aware patterns | Physics | 4 | Active |
| US10339254B2 | Integrated circuit design systems and methods | Emerging Cross-Sectional Technologies | 2 | Active |
| US9023730B1 | Methods for fabricating integrated circuits including generating e-beam patterns for directed self-assembly | Electricity | 1 | Active |
| US9009634B2 | Methods for fabricating integrated circuits including generating photomasks for directed self-assembly | Performing Operations; Transporting | 1 | Active |
| US9170501B2 | Methods for fabricating integrated circuits including generating photomasks for directed self-assembly | Physics | 1 | Active |
| US9959380B2 | Integrated circuit design systems and methods | Emerging Cross-Sectional Technologies | 0 | Active |
| US11714944B2 | Optimization of physical cell placement for integrated circuits | Emerging Cross-Sectional Technologies | 0 | Active |
| US10936778B2 | And optimization of physical cell placement | Emerging Cross-Sectional Technologies | 0 | Active |
| US8910090B2 | Methods involving pattern matching to identify and resolve potential non-double-patterning-compliant patterns in double patterning applications | Emerging Cross-Sectional Technologies | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.