Yoshiro Kabe
23Patents
4h-index
23Co-inventors
63Inventor score
Filing activity: Mar 1, 2004 → Nov 16, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8119530B2 | Pattern forming method and semiconductor device manufacturing method | Electricity | 181 | Active |
| US7524774B2 | Manufacturing method of semiconductor device, semiconductor manufacturing apparatus, plasma nitridation method, computer recording medium, and program | Electricity | 10 | Active |
| US11394364B2 | Acoustic wave device with anti-reflection layer | Electricity | 7 | Active |
| US8372761B2 | Plasma oxidation processing method, plasma processing apparatus and storage medium | Electricity | 6 | Active |
| US7981785B2 | Method for manufacturing semiconductor device and plasma oxidation method | Electricity | 3 | Active |
| US7887637B2 | Method for cleaning treatment chamber in substrate treating apparatus and method for detecting endpoint of cleaning | Electricity | 3 | Active |
| US8034179B2 | Method for insulating film formation, storage medium from which information is readable with computer, and processing system | Electricity | 2 | Active |
| US7910495B2 | Plasma oxidizing method, plasma processing apparatus, and storage medium | Electricity | 2 | Active |
| US8105958B2 | Semiconductor device manufacturing method and plasma oxidation treatment method | Electricity | 1 | Active |
| US8318267B2 | Method and apparatus for forming silicon oxide film | Electricity | 1 | Active |
| US11855603B2 | Methods of manufacturing acoustic wave device with anti-reflection layer | Electricity | 1 | Active |
| US10413999B2 | Methods of manufacturing axisymmetric body and axisymmetric product | Emerging Cross-Sectional Technologies | 1 | Active |
| US11522515B2 | Acoustic wave device including interdigital electrodes covered by silicon oxynitride film | Electricity | 1 | Active |
| US7989364B2 | Plasma oxidation processing method | Electricity | 1 | Active |
| US8389420B2 | Method and apparatus for forming silicon oxide film | Electricity | 1 | Active |
| US10259029B2 | Spinning forming device | Performing Operations; Transporting | 0 | Active |
| US8003484B2 | Method for forming silicon oxide film, plasma processing apparatus and storage medium | Electricity | 0 | Active |
| US10632522B2 | Method of manufacturing preliminary formed body and axisymmetrical component | Electricity | 0 | Active |
| US8026187B2 | Method of forming silicon oxide film and method of production of semiconductor memory device using this method | Electricity | 0 | Active |
| US8043979B2 | Plasma oxidizing method, storage medium, and plasma processing apparatus | Electricity | 0 | Active |
| US10882094B2 | Spinning forming method | Performing Operations; Transporting | 0 | Active |
| US10259030B2 | Spinning forming device | Chemistry; Metallurgy | 0 | Active |
| US12255600B2 | Methods of manufacturing acoustic wave device with anti-reflection layer | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.