Adeia Semiconductor Solutions LLC
23Patents
23Active
23Granted
60Portfolio score
Filing activity: Oct 8, 2020 → Mar 21, 2024
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11901438B2 | Nanosheet transistor | Electricity | 1 | Active |
| US11784095B2 | Fabrication of a vertical fin field effect transistor with reduced dimensional variations | Electricity | 1 | Active |
| USRE49794E1 | SRAM design to facilitate single fin cut in double sidewall image transfer process | General | 0 | Active |
| US12369379B2 | Nanosheet transistor | Electricity | 0 | Active |
| US12166110B2 | Nanosheet channel-to-source and drain isolation | Electricity | 0 | Active |
| US12154971B2 | Forming nanosheet transistor using sacrificial spacer and inner spacers | Electricity | 0 | Active |
| US11894462B2 | Forming a sacrificial liner for dual channel devices | Electricity | 0 | Active |
| US12387983B2 | Forming self-aligned vias and air-gaps in semiconductor fabrication | Electricity | 0 | Active |
| US12230544B2 | Stacked transistors with different channel widths | Electricity | 0 | Active |
| US12136573B2 | Fabrication of a vertical fin field effect transistor with reduced dimensional variations | Electricity | 0 | Active |
| US12224203B2 | Air gap spacer formation for nano-scale semiconductor devices | Electricity | 0 | Active |
| US12237368B2 | Semiconductor structures including middle-of-line (MOL) capacitance reduction for self-aligned contact in gate stack | Electricity | 0 | Active |
| US12369367B2 | Bulk nanosheet with dielectric isolation | Electricity | 0 | Active |
| US12218003B2 | Selective ILD deposition for fully aligned via with airgap | Electricity | 0 | Active |
| US12119393B2 | Punch through stopper in bulk finFET device | Electricity | 0 | Active |
| US12183634B2 | Selective recessing to form a fully aligned via | Electricity | 0 | Active |
| US12327730B2 | Two-color self-aligned double patterning (SADP) to yield static random access memory (SRAM) and dense logic | Electricity | 0 | Active |
| US12402403B2 | Air gap spacer for metal gates | Electricity | 0 | Active |
| US11955424B2 | Semiconductor device including a porous dielectric layer, and method of forming the semiconductor device | Electricity | 0 | Active |
| USRE50613E1 | FinFET gate cut after dummy gate removal | General | 0 | Active |
| US12376369B2 | FinFET devices | Electricity | 0 | Active |
| US12322601B2 | Alternating hardmasks for tight-pitch line formation | Electricity | 0 | Active |
| US12237328B2 | Minimizing shorting between FinFET epitaxial regions | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.