WONIK IPS CO., LTD.
36Patents
36Active
36Granted
55Portfolio score
Filing activity: Jun 28, 2007 → Oct 12, 2023 · 3 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9732424B2 | Gas injection apparatus and substrate processing apparatus using same | Electricity | 11 | Active |
| US9464353B2 | Substrate processing apparatus | Chemistry; Metallurgy | 5 | Active |
| US8741160B2 | Method for manufacturing solar cell and solar cell manufactured by the same method | Emerging Cross-Sectional Technologies | 2 | Active |
| US8673676B2 | Surface processing method of silicon substrate for solar cell, and manufacturing method of solar cell | Emerging Cross-Sectional Technologies | 1 | Active |
| US9506146B2 | Thin film vapor deposition method and thin film vapor deposition apparatus | Chemistry; Metallurgy | 0 | Active |
| US10699900B2 | Method for forming thin film | Electricity | 0 | Active |
| US11482452B2 | Method of forming a contact plug in a semiconductor integrated circuit device | Electricity | 0 | Active |
| US10811294B2 | Substrate transfer apparatus and control method thereof | Electricity | 0 | Active |
| US11292023B2 | Substrate processing apparatus | Electricity | 0 | Active |
| US12024777B2 | Method of processing substrate | Electricity | 0 | Active |
| US10662528B2 | Substrate processing apparatus and substrate processing method using the same | Electricity | 0 | Active |
| US11823907B2 | Processing method for substrate | Electricity | 0 | Active |
| US11769681B2 | Transfer robot and substrate processing apparatus having the same | Electricity | 0 | Active |
| US10752993B2 | Substrate processing apparatus and substrate processing method | Electricity | 0 | Active |
| US11967503B2 | Method of depositing thin film and method of manufacturing semiconductor device using the same | Electricity | 0 | Active |
| US9793476B2 | Apparatus and method for treating a substrate | Electricity | 0 | Active |
| US10985015B2 | Method for preparing composite membrane | Electricity | 0 | Active |
| US12371783B2 | Internal chamber processing method and substrate processing method | Electricity | 0 | Active |
| US10381217B2 | Method of depositing a thin film | Electricity | 0 | Active |
| US9269568B2 | Method of manufacturing semiconductor device using the same | Electricity | 0 | Active |
| US11875998B2 | Substrate processing method | Electricity | 0 | Active |
| US11651960B2 | Method for forming amorphous silicon thin film, method for manufacturing semiconductor device including same, and semiconductor manufactured thereby | Electricity | 0 | Active |
| US10418589B2 | Substrate processing method | Electricity | 0 | Active |
| US12377483B2 | Method of assembling substrate supporting apparatus | Electricity | 0 | Active |
| US12249536B2 | Substrate supporting assembly and substrate processing apparatus | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.