Anda C. Mocuta
28Patents
12h-index
66Co-inventors
80Inventor score
Filing activity: Nov 21, 2000 → Jan 6, 2014
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6916698B2 | High performance CMOS device structure with mid-gap metal gate | Electricity | 133 | Expired |
| US7723750B2 | MOSFET with super-steep retrograded island | Electricity | 124 | Active |
| US6881635B1 | Strained silicon NMOS devices with embedded source/drain | Electricity | 102 | Expired |
| US6762469B2 | High performance CMOS device structure with mid-gap metal gate | Electricity | 60 | Expired |
| US7705345B2 | High performance strained silicon FinFETs device and method for forming same | Electricity | 46 | Expired |
| US7067400B2 | Method for preventing sidewall consumption during oxidation of SGOI islands | Emerging Cross-Sectional Technologies | 46 | Expired |
| US6303450A | CMOS device structures and method of making same | Electricity | 37 | Expired |
| US6746924B1 | Method of forming asymmetric extension mosfet using a drain side spacer | Electricity | 28 | Expired |
| US8626480B2 | Compact model for device/circuit/chip leakage current (IDDQ) calculation including process induced uplift factors | Physics | 18 | Active |
| US7056782B2 | CMOS silicide metal gate integration | Electricity | 15 | Expired |
| US6509241B2 | Process for fabricating an MOS device having highly-localized halo regions | Electricity | 14 | Expired |
| US7268049B2 | Structure and method for manufacturing MOSFET with super-steep retrograded island | Electricity | 14 | Expired |
| US7560326B2 | Silicon/silcion germaninum/silicon body device with embedded carbon dopant | Electricity | 12 | Active |
| US7691698B2 | Pseudomorphic Si/SiGe/Si body device with embedded SiGe source/drain | Electricity | 8 | Active |
| US6635517B2 | Use of disposable spacer to introduce gettering in SOI layer | Electricity | 6 | Expired |
| US7411227B2 | CMOS silicide metal gate integration | Electricity | 5 | Expired |
| US7879650B2 | Method of providing protection against charging damage in hybrid orientation transistors | Electricity | 3 | Active |
| US7655557B2 | CMOS silicide metal gate integration | Electricity | 3 | Active |
| US8239790B2 | Methods and system for analysis and management of parametric yield | Physics | 3 | Active |
| US8042070B2 | Methods and system for analysis and management of parametric yield | Physics | 2 | Active |
| US8168971B2 | Pseudomorphic Si/SiGe/Si body device with embedded SiGe source/drain | Electricity | 1 | Active |
| US8754412B2 | Intra die variation monitor using through-silicon via | Electricity | 1 | Active |
| US9639652B2 | Compact model for device/circuit/chip leakage current (IDDQ) calculation including process induced uplift factors | Physics | 1 | Active |
| US8429576B2 | Methods and system for analysis and management of parametric yield | Physics | 1 | Active |
| US7928513B2 | Protection against charging damage in hybrid orientation transistors | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.