Andre P. Labonte
56Patents
9h-index
43Co-inventors
78Inventor score
Filing activity: Dec 2, 2003 → May 13, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10026824B1 | Air-gap gate sidewall spacer and method | Electricity | 31 | Active |
| US9824921B1 | Method and apparatus for placing a gate contact inside a semiconductor active region having high-k dielectric gate caps | Electricity | 23 | Active |
| US10243053B1 | Gate contact structure positioned above an active region of a transistor device | Electricity | 22 | Active |
| US9490317B1 | Gate contact structure having gate contact layer | Electricity | 21 | Active |
| US9691897B2 | Three-dimensional semiconductor transistor with gate contact in active region | Electricity | 20 | Active |
| US9780178B2 | Methods of forming a gate contact above an active region of a semiconductor device | Electricity | 17 | Active |
| US9397049B1 | Gate tie-down enablement with inner spacer | Electricity | 15 | Active |
| US9929048B1 | Middle of the line (MOL) contacts with two-dimensional self-alignment | Electricity | 15 | Active |
| US9941278B2 | Method and apparatus for placing a gate contact inside an active region of a semiconductor | Electricity | 12 | Active |
| US8507375B1 | Alignment tolerant semiconductor contact and method | Electricity | 9 | Active |
| US9324656B1 | Methods of forming contacts on semiconductor devices and the resulting devices | Electricity | 8 | Active |
| US7968418B1 | Apparatus and method for isolating integrated circuit components using deep trench isolation and shallow trench isolation | Electricity | 7 | Active |
| US9455254B2 | Methods of forming a combined gate and source/drain contact structure and the resulting device | Electricity | 7 | Active |
| US9502286B2 | Methods of forming self-aligned contact structures on semiconductor devices and the resulting devices | Electricity | 6 | Active |
| US9478662B2 | Gate and source/drain contact structures for a semiconductor device | Electricity | 6 | Active |
| US9640625B2 | Self-aligned gate contact formation | Electricity | 6 | Active |
| US8004032B1 | System and method for providing low voltage high density multi-bit storage flash memory | Electricity | 6 | Active |
| US9947589B1 | Methods of forming a gate contact for a transistor above an active region and the resulting device | Electricity | 5 | Active |
| US7175777B1 | Method of forming a sub-micron tip feature | Electricity | 5 | Expired |
| US9570397B1 | Local interconnect structure including non-eroded contact via trenches | Electricity | 5 | Active |
| US8580628B2 | Integrated circuit contact structure and method | Electricity | 4 | Active |
| US10204994B2 | Methods of forming a semiconductor device with a gate contact positioned above the active region | Electricity | 4 | Active |
| US7781295B1 | System and method for providing a single deposition emitter/base in a bipolar junction transistor | Electricity | 4 | Active |
| US11112694B2 | Methods of forming variable-depth device structures | Physics | 4 | Active |
| US10249728B2 | Air-gap gate sidewall spacer and method | Electricity | 3 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.