Inventor · Portland, OR, US

Christopher P. Auth

69Patents
8h-index
44Co-inventors
78Inventor score

Filing activity: Mar 31, 2003 → Apr 11, 2024

Most-cited inventions

PatentTitleAreaCited byStatus
US10121875B1 Replacement gate structures for advanced integrated circuit structure fabrication Electricity 49 Active
US7691752B2 Methods of forming improved EPI fill on narrow isolation bounded source/drain regions and structures formed thereby Electricity 42 Active
US6870179B2 Increasing stress-enhanced drive current in a MOS transistor Electricity 32 Expired
US10121882B1 Gate line plug structures for advanced integrated circuit structure fabrication Electricity 27 Active
US10677543B2 Cooling tower Emerging Cross-Sectional Technologies 9 Active
US10741669B2 Differentiated voltage threshold metal gate structures for advanced integrated circuit structure fabrication Electricity 9 Active
US10304940B1 Gate cut and fin trim isolation for advanced integrated circuit structure fabrication Electricity 8 Active
US10734379B2 Fin end plug structures for advanced integrated circuit structure fabrication Electricity 8 Active
US10541316B2 Contact over active gate structures for advanced integrated circuit structure fabrication Electricity 6 Active
US10460993B2 Fin cut and fin trim isolation for advanced integrated circuit structure fabrication Electricity 6 Active
US10756204B2 Fin trim isolation with single gate spacing for advanced integrated circuit structure fabrication Electricity 6 Active
US10615265B2 Gate cut and fin trim isolation for advanced integrated circuit structure fabrication Electricity 6 Active
US7861406B2 Method of forming CMOS transistors with dual-metal silicide formed through the contact openings Emerging Cross-Sectional Technologies 5 Active
US7338847B2 Methods of manufacturing a stressed MOS transistor structure Electricity 5 Expired
US10707133B2 Trench plug hardmask for advanced integrated circuit structure fabrication Electricity 4 Active
US10886383B2 Replacement gate structures for advanced integrated circuit structure fabrication Electricity 3 Active
US10777655B2 Heterogeneous metal line compositions for advanced integrated circuit structure fabrication Electricity 3 Active
US10796968B2 Dual metal silicide structures for advanced integrated circuit structure fabrication Electricity 3 Active
US10840151B2 Dual metal silicide structures for advanced integrated circuit structure fabrication Electricity 3 Active
US10727313B2 Dual metal gate structures for advanced integrated circuit structure fabrication Electricity 3 Active
US10796951B2 Etch-stop layer topography for advanced integrated circuit structure fabrication Electricity 3 Active
US10790378B2 Replacement gate structures for advanced integrated circuit structure fabrication Electricity 3 Active
US10777656B2 Fin cut and fin trim isolation for advanced integrated circuit structure fabrication Electricity 3 Active
US10775117B2 Water collection/deflection arrangements Emerging Cross-Sectional Technologies 3 Active
US11031487B2 Contact over active gate structures for advanced integrated circuit structure fabrication Electricity 3 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.