Inventor · Heidelberg, DE

Haci Osman GUEVENC

13Patents

2h-index

17Co-inventors

43Inventor score

Filing activity: Jul 14, 2015 → Sep 14, 2023

Most-cited inventions

Patent	Title	Area	Cited by	Status
US10385236B2	Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates	Electricity	2	Active
US10899945B2	Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates	Electricity	2	Active
US10844333B2	Composition for post chemical-mechanical-polishing cleaning	Chemistry; Metallurgy	0	Active
US10738219B2	Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates	Chemistry; Metallurgy	0	Active
US11264250B2	Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates	Chemistry; Metallurgy	0	Active
US11725117B2	Chemical mechanical polishing of substrates containing copper and ruthenium	Chemistry; Metallurgy	0	Active
US10865361B2	Composition for post chemical-mechanical-polishing cleaning	Chemistry; Metallurgy	0	Active
US12378439B2	Compositions for tungsten etching inhibition	Electricity	0	Active
US12351737B2	Chemical mechanical polishing of substrates containing copper and ruthenium	Electricity	0	Active
US10844325B2	Composition for post chemical-mechanical-polishing cleaning	Chemistry; Metallurgy	0	Active
US10570316B2	Chemical mechanical polishing (CMP) composition	Chemistry; Metallurgy	0	Active
US11286402B2	Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates	Electricity	0	Active
US11993729B2	Chemical mechanical polishing composition	Electricity	0	Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.