Hideki Takeuchi
105Patents
29h-index
97Co-inventors
93Inventor score
Filing activity: Oct 30, 1975 → Jul 2, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9275996B2 | Vertical semiconductor devices including superlattice punch through stop layer and related methods | Electricity | 103 | Active |
| US9406753B2 | Semiconductor devices including superlattice depletion layer stack and related methods | Electricity | 98 | Active |
| US9899479B2 | Semiconductor devices with superlattice layers providing halo implant peak confinement and related methods | Electricity | 83 | Active |
| US10084045B2 | Semiconductor device including a superlattice and replacement metal gate structure and related methods | Electricity | 68 | Active |
| US9941359B2 | Semiconductor devices with superlattice and punch-through stop (PTS) layers at different depths and related methods | Electricity | 65 | Active |
| US9972685B2 | Vertical semiconductor devices including superlattice punch through stop layer and related methods | Electricity | 59 | Active |
| US7217243B2 | Ultrasound diagnosis apparatus | Human Necessities | 59 | Expired |
| US10170603B2 | Semiconductor device including a resonant tunneling diode structure with electron mean free path control layers | Electricity | 57 | Active |
| US10170604B2 | Method for making a semiconductor device including a resonant tunneling diode with electron mean free path control layers | Electricity | 56 | Active |
| US10304881B1 | CMOS image sensor with buried superlattice layer to reduce crosstalk | Electricity | 48 | Active |
| US10249745B2 | Method for making a semiconductor device including a resonant tunneling diode structure having a superlattice | Electricity | 48 | Active |
| US10593761B1 | Method for making a semiconductor device having reduced contact resistance | Electricity | 44 | Active |
| US10367028B2 | CMOS image sensor including stacked semiconductor chips and image processing circuitry including a superlattice | Electricity | 43 | Active |
| US10580866B1 | Semiconductor device including source/drain dopant diffusion blocking superlattices to reduce contact resistance | Electricity | 42 | Active |
| US10608043B2 | Method for making CMOS image sensor including stacked semiconductor chips and readout circuitry including a superlattice | Electricity | 41 | Active |
| US10615209B2 | CMOS image sensor including stacked semiconductor chips and readout circuitry including a superlattice | Electricity | 40 | Active |
| US10529757B2 | CMOS image sensor including pixels with read circuitry having a superlattice | Electricity | 40 | Active |
| US10396223B2 | Method for making CMOS image sensor with buried superlattice layer to reduce crosstalk | Electricity | 40 | Active |
| US10381242B2 | Method for making a semiconductor device including a superlattice as a gettering layer | Electricity | 40 | Active |
| US10529768B2 | Method for making CMOS image sensor including pixels with read circuitry having a superlattice | Electricity | 40 | Active |
| US10453945B2 | Semiconductor device including resonant tunneling diode structure having a superlattice | Electricity | 40 | Active |
| US10355151B2 | CMOS image sensor including photodiodes with overlying superlattices to reduce crosstalk | Electricity | 40 | Active |
| US10580867B1 | FINFET including source and drain regions with dopant diffusion blocking superlattice layers to reduce contact resistance | Electricity | 40 | Active |
| US10461118B2 | Method for making CMOS image sensor including photodiodes with overlying superlattices to reduce crosstalk | Electricity | 40 | Active |
| US5693223A | Column and column device for low pressure-high speed liquid chromatography and a method for using said column device | Physics | 40 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.