Hongfa Luan
21Patents
5h-index
26Co-inventors
65Inventor score
Filing activity: Dec 20, 2004 → Jul 25, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7361538B2 | Transistors and methods of manufacture thereof | Electricity | 66 | Expired |
| US8889497B2 | Semiconductor devices and methods of manufacture thereof | Electricity | 17 | Active |
| US7253050B2 | Transistor device and method of manufacture thereof | Electricity | 8 | Expired |
| US8188551B2 | Semiconductor devices and methods of manufacture thereof | Electricity | 8 | Active |
| US7696517B2 | NMOS transistors that mitigate fermi-level pinning by employing a hafnium-silicon gate electrode and high-k gate dieletric | Electricity | 6 | Active |
| US8017484B2 | Transistor device and methods of manufacture thereof | Electricity | 5 | Active |
| US10504735B2 | Method of forming a semiconductor device by high-pressure anneal and post-anneal treatment | Electricity | 3 | Active |
| US10714348B2 | Semiconductor device having hydrogen in a dielectric layer | Electricity | 3 | Active |
| US8722473B2 | Semiconductor devices and methods of manufacture thereof | Electricity | 2 | Active |
| US9006802B2 | Semiconductor device manufacturing methods and methods of forming insulating material layers | Electricity | 2 | Active |
| US10950447B2 | Semiconductor device having hydrogen in a dielectric layer | Electricity | 2 | Active |
| US9153657B2 | Semiconductor devices comprising a fin | Electricity | 1 | Active |
| US11776814B2 | Method of forming semiconductor device by driving hydrogen into a dielectric layer from another dielectric layer | Electricity | 1 | Active |
| US9659962B2 | Semiconductor devices and methods of manufacture thereof | Electricity | 1 | Active |
| US7160781B2 | Transistor device and methods of manufacture thereof | Electricity | 1 | Expired |
| US8269289B2 | Transistor device and methods of manufacture thereof | Electricity | 0 | Active |
| US9607826B2 | Semiconductor device manufacturing methods and methods of forming insulating material layers | Electricity | 0 | Active |
| US9660023B2 | Semiconductor film with adhesion layer and method for forming the same | Electricity | 0 | Active |
| US12183581B2 | Method of forming a semiconductor device by driving hydrogen into a dielectric layer from another dielectric layer | Electricity | 0 | Active |
| US10269900B2 | Semiconductor film with adhesion layer and method for forming the same | Electricity | 0 | Active |
| US9219120B2 | Semiconductor film with adhesion layer and method for forming the same | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.