Hsin-Che Chiang
56Patents
3h-index
34Co-inventors
66Inventor score
Filing activity: Nov 25, 2003 → Mar 13, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10128156B1 | FinFET device with reduced parasitic capacitance and method for fabricating the same | Electricity | 5 | Active |
| US9859273B2 | Semiconductor structure and manufacturing process thereof | Electricity | 5 | Active |
| US10741558B2 | Nanosheet CMOS device and method of forming | Electricity | 5 | Active |
| US10854506B2 | Semiconductor device and manufacturing method thereof | Electricity | 2 | Active |
| US7048603B2 | Method for manufacturing organic light-emitting diodes | Electricity | 2 | Expired |
| US10134873B2 | Semiconductor device gate structure and method of fabricating thereof | Electricity | 2 | Active |
| US11282705B2 | Semiconductor device and method of forming the same | Electricity | 2 | Active |
| US10529629B2 | Methods of forming metal gates | Electricity | 2 | Active |
| US10991805B2 | Semiconductor device and method of manufacture | Electricity | 1 | Active |
| US10714342B2 | Semiconductor device and method of forming the same | Electricity | 1 | Active |
| US8255449B2 | High-speed continuous-time fir filter | Electricity | 1 | Active |
| US10475895B2 | Semiconductor device and method for manufacturing the same | Electricity | 1 | Active |
| US10403737B2 | Method of forming a gate structure of a semiconductor device | Electricity | 1 | Active |
| US11315785B2 | Epitaxial blocking layer for multi-gate devices and fabrication methods thereof | Electricity | 1 | Active |
| US10879393B2 | Methods of fabricating semiconductor devices having gate structure with bent sidewalls | Electricity | 1 | Active |
| US12183810B2 | Semiconductor devices and methods of manufacture | Electricity | 0 | Active |
| US11145730B2 | Semiconductor device and method for manufacturing the same | Electricity | 0 | Active |
| US11282942B2 | Semiconductor device structure with uniform threshold voltage distribution and method of forming the same | Electricity | 0 | Active |
| US8533252B2 | Broad-band active delay line | Electricity | 0 | Active |
| US11101385B2 | Fin field effect transistor (FinFET) device structure with air gap and method for forming the same | Electricity | 0 | Active |
| US11521971B2 | Gate dielectric having a non-uniform thickness profile | Electricity | 0 | Active |
| US12027415B2 | Semiconductor device structures | Electricity | 0 | Active |
| US12336272B2 | Semiconductor device structure and methods of forming the same | Electricity | 0 | Active |
| US11799017B2 | Semiconductor device structure with uniform threshold voltage distribution and method of forming the same | Electricity | 0 | Active |
| US12376326B2 | Gate resistance improvement and method thereof | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.