Inventor · Munich, DE

Josef Mathuni

15Patents
6h-index
15Co-inventors
63Inventor score

Filing activity: Jan 11, 1982 → Aug 30, 2012

Most-cited inventions

PatentTitleAreaCited byStatus
US5945351A Method for etching damaged zones on an edge of a semiconductor substrate, and etching system Physics 112 Expired
US5693182A Method for damage etching the back side of a semiconductor disk having a protected front side Electricity 22 Expired
US5489362A Method for generating excited neutral particles for etching and deposition processes in semiconductor technology with a plasma discharge fed by microwave energy Fixed Constructions 21 Expired
US4390394A Method of structuring with metal oxide masks by reactive ion-beam etching Emerging Cross-Sectional Technologies 13 Expired
US6013136A Apparatus for plasma-supported back etching of a semiconductor wafer Electricity 9 Expired
US5874366A Method for etching a semiconductor substrate and etching system Electricity 9 Expired
US6706141B1 Device to generate excited/ionized particles in a plasma Electricity 6 Expired
US5073515A Method for manufacturing a trench capacitor of a one-transistor memory cell in a semiconductor substrate with a self-aligned capacitor plate electrode Electricity 4 Expired
US7063921B2 Photomask, in particular alternating phase shift mask, with compensation structure Emerging Cross-Sectional Technologies 3 Expired
US8815746B2 Apparatus and method for producing microcomponents and use of Performing Operations; Transporting 0 Active
US6919147B2 Production method for a halftone phase mask Physics 0 Expired
US6569772B2 Method for producing an alternating phase mask Physics 0 Expired
US7665416B2 Apparatus for generating excited and/or ionized particles in a plasma and a method for generating ionized particles Electricity 0 Active
US7071110B2 Process for the plasma etching of materials not containing silicon Physics 0 Expired
US6152073A Assembly for the manufacture of highly integrated circuits on a semiconductor substrate Electricity 0 Expired

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.