Ming Li
20Patents
9h-index
34Co-inventors
71Inventor score
Filing activity: Mar 17, 2004 → Apr 1, 2013
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7427788B2 | Multi bridge channel field effect transistors with nano-wire channels and methods of manufacturing the same | Electricity | 139 | Expired |
| US7374986B2 | Method of fabricating field effect transistor (FET) having wire channels | Electricity | 85 | Active |
| US7002175B1 | Method of making resonant tunneling diodes and CMOS backend-process-compatible three dimensional (3-D) integration | Electricity | 76 | Expired |
| US7396730B2 | Integrated circuit devices including an L-shaped depletion barrier layer adjacent opposite sides of a gate pattern and methods of forming the same | Electricity | 44 | Expired |
| US7332386B2 | Methods of fabricating fin field transistors | Electricity | 37 | Expired |
| US7274051B2 | Field effect transistor (FET) having wire channels and method of fabricating the same | Electricity | 31 | Expired |
| US7361545B2 | Field effect transistor with buried gate pattern | Electricity | 16 | Active |
| US8815702B2 | Methods of manufacturing semiconductor devices having a support structure for an active layer pattern | Electricity | 9 | Active |
| US8124961B2 | Single electron transistor | Emerging Cross-Sectional Technologies | 9 | Active |
| US7389664B1 | Electromagnetic forming device for sheet of material | Emerging Cross-Sectional Technologies | 6 | Active |
| US8528376B2 | Mold set for manufacturing case and the method thereof | Emerging Cross-Sectional Technologies | 4 | Active |
| US7504328B2 | Schottky barrier source/drain n-mosfet using ytterbium silicide | Electricity | 3 | Expired |
| US7858457B2 | Methods of forming integrated circuit devices including a depletion barrier layer at source/drain regions | Electricity | 3 | Active |
| US8426901B2 | Semiconductor devices having a support structure for an active layer pattern | Electricity | 2 | Active |
| US7955932B2 | Single electron transistor and method of manufacturing the same | Emerging Cross-Sectional Technologies | 2 | Active |
| US7989854B2 | Semiconductor devices having a support structure for an active layer pattern | Electricity | 1 | Active |
| US7579657B2 | Semiconductor device with multiple channels | Electricity | 0 | Active |
| US8008141B2 | Method of fabricating a semiconductor device with multiple channels | Electricity | 0 | Active |
| US7514360B2 | Thermal robust semiconductor device using HfN as metal gate electrode and the manufacturing process thereof | Electricity | 0 | Expired |
| US8680588B2 | Field effect transistor with buried gate pattern | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.