Naomu Kitano
22Patents
4h-index
28Co-inventors
59Inventor score
Filing activity: Feb 6, 2006 → Mar 5, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8088678B2 | Semiconductor manufacturing apparatus and method | Electricity | 13 | Active |
| US7867847B2 | Method of manufacturing dielectric film that has hafnium-containing and aluminum-containing oxynitride | Electricity | 5 | Active |
| US8030694B2 | Dielectric film and semiconductor device using dielectric film including hafnium, aluminum or silicon, nitrogen, and oxygen | Electricity | 4 | Active |
| US7857946B2 | Sputtering film forming method, electronic device manufacturing method, and sputtering system | Chemistry; Metallurgy | 4 | Active |
| US7923360B2 | Method of forming dielectric films | Electricity | 3 | Active |
| US8178934B2 | Dielectric film with hafnium aluminum oxynitride film | Electricity | 3 | Active |
| US8415753B2 | Semiconductor device and method of manufacturing the same | Electricity | 3 | Active |
| US8053311B2 | Dielectric film and semiconductor device using dielectric film including hafnium, aluminum or silicon, nitrogen, and oxygen | Electricity | 3 | Active |
| US8288234B2 | Method of manufacturing hafnium-containing and silicon-containing metal oxynitride dielectric film | Electricity | 3 | Active |
| US8481382B2 | Method and apparatus for manufacturing semiconductor device | Electricity | 2 | Active |
| US8148275B2 | Method for forming dielectric films | Electricity | 2 | Active |
| US8835296B2 | Electronic component manufacturing method including step of embedding metal film | Electricity | 2 | Active |
| US8324608B2 | Nonvolatile storage element and manufacturing method thereof | Electricity | 2 | Active |
| US7655549B2 | Method for depositing a metal gate on a high-k dielectric film | Electricity | 2 | Active |
| US8232189B2 | Dielectric film manufacturing method | Electricity | 2 | Active |
| US8026143B2 | Semiconductor element and manufacturing method thereof | Electricity | 1 | Active |
| US8012822B2 | Process for forming dielectric films | Electricity | 1 | Active |
| US8524617B2 | Methods for manufacturing dielectric films | Electricity | 0 | Active |
| US9437702B2 | Electronic component manufacturing method and electrode structure | Electricity | 0 | Active |
| US8669624B2 | Semiconductor device and manufacturing method thereof | Electricity | 0 | Active |
| US10297797B2 | Method for manufacturing display device | Electricity | 0 | Active |
| US8786031B2 | Metal nitride film, semiconductor device using the metal nitride film, and manufacturing method of semiconductor device | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.