Patrick Breiling
22Patents
6h-index
49Co-inventors
69Inventor score
Filing activity: Mar 17, 2003 → May 31, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9399228B2 | Method and apparatus for purging and plasma suppression in a process chamber | Emerging Cross-Sectional Technologies | 411 | Active |
| US7854828B2 | Method and apparatus for electroplating including remotely positioned second cathode | Chemistry; Metallurgy | 48 | Active |
| US8741394B2 | In-situ deposition of film stacks | Electricity | 15 | Active |
| US9758868B1 | Plasma suppression behind a showerhead through the use of increased pressure | Chemistry; Metallurgy | 14 | Active |
| US9028924B2 | In-situ deposition of film stacks | Electricity | 6 | Active |
| US10604841B2 | Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition | Electricity | 6 | Active |
| US10214816B2 | PECVD apparatus for in-situ deposition of film stacks | Electricity | 4 | Active |
| US10655224B2 | Conical wafer centering and holding device for semiconductor processing | Electricity | 4 | Active |
| US11608559B2 | Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition | Electricity | 4 | Active |
| US11101164B2 | Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition | Electricity | 3 | Active |
| US10622243B2 | Planar substrate edge contact with open volume equalization pathways and side containment | Electricity | 2 | Active |
| US7413616B2 | Active rinse shield for electrofill chemical bath and method of use | Emerging Cross-Sectional Technologies | 1 | Active |
| US12000047B2 | Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition | Electricity | 1 | Active |
| US10984987B2 | Showerhead faceplate having flow apertures configured for hollow cathode discharge suppression | Electricity | 1 | Active |
| US7146994B2 | Active rinse shield for electrofill chemical bath and method of use | Emerging Cross-Sectional Technologies | 1 | Expired |
| US12385138B2 | Plasma-enhanced deposition of film stacks | Electricity | 0 | Active |
| US11232966B2 | Electrostatic chucking pedestal with substrate backside purging and thermal sinking | Electricity | 0 | Active |
| US11443975B2 | Planar substrate edge contact with open volume equalization pathways and side containment | Electricity | 0 | Active |
| US11837443B2 | Showerhead faceplate having flow apertures configured for hollow cathode discharge suppression | Electricity | 0 | Active |
| US11515124B2 | Showerhead faceplate having flow apertures configured for hollow cathode discharge suppression | Electricity | 0 | Active |
| US12331402B2 | Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition | Electricity | 0 | Active |
| US12142509B2 | Electrostatic chuck with seal surface | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.