Patrick Morrow
187Patents
18h-index
134Co-inventors
89Inventor score
Filing activity: Nov 5, 1999 → Jan 22, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7410884B2 | 3D integrated circuits using thick metal for backside connections and offset bumps | Electricity | 245 | Active |
| US6946384B2 | Stacked device underfill and a method of fabrication | Electricity | 219 | Expired |
| US6887762B1 | Method of fabricating a field effect transistor structure with abrupt source/drain junctions | Electricity | 103 | Expired |
| US6797556B2 | MOS transistor structure and method of fabrication | Electricity | 90 | Expired |
| US6541343B1 | Methods of making field effect transistor structure with partially isolated source/drain junctions | Electricity | 69 | Expired |
| US7056813B2 | Methods of forming backside connections on a wafer stack | Electricity | 62 | Expired |
| US6897125B2 | Methods of forming backside connections on a wafer stack | Electricity | 59 | Expired |
| US7274191B2 | Integrated on-chip NMR and ESR device and method for making and using the same | Physics | 52 | Expired |
| US6479391B2 | Method for making a dual damascene interconnect using a multilayer hard mask | Electricity | 48 | Expired |
| US7345479B2 | Portable NMR device and method for making and using the same | Physics | 47 | Expired |
| US7391087B2 | MOS transistor structure and method of fabrication | Electricity | 37 | Expired |
| US6448177B1 | Method of making a semiconductor device having a dual damascene interconnect spaced from a support structure | Electricity | 33 | Expired |
| US7129172B2 | Bonded wafer processing method | Emerging Cross-Sectional Technologies | 31 | Expired |
| US7436035B2 | Method of fabricating a field effect transistor structure with abrupt source/drain junctions | Electricity | 29 | Expired |
| US7682916B2 | Field effect transistor structure with abrupt source/drain junctions | Electricity | 29 | Active |
| US7338873B2 | Method of fabricating a field effect transistor structure with abrupt source/drain junctions | Electricity | 24 | Expired |
| US9685436B2 | Monolithic three-dimensional (3D) ICs with local inter-level interconnects | Electricity | 21 | Active |
| US7755124B2 | Laminating magnetic materials in a semiconductor device | Emerging Cross-Sectional Technologies | 18 | Active |
| US8421225B2 | Three-dimensional stacked substrate arrangements | Electricity | 14 | Active |
| US10872820B2 | Integrated circuit structures | Emerging Cross-Sectional Technologies | 13 | Active |
| US10068874B2 | Method for direct integration of memory die to logic die without use of thru silicon vias (TSV) | Electricity | 11 | Active |
| US10886217B2 | Integrated circuit device with back-side interconnection to deep source/drain semiconductor | Electricity | 11 | Active |
| US10734412B2 | Backside contact resistance reduction for semiconductor devices with metallization on both sides | Electricity | 11 | Active |
| US7214594B2 | Method of making semiconductor device using a novel interconnect cladding layer | Electricity | 11 | Expired |
| US6661094B2 | Semiconductor device having a dual damascene interconnect spaced from a support structure | Electricity | 9 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.