Roza Kotlyar
47Patents
8h-index
64Co-inventors
74Inventor score
Filing activity: Dec 30, 2009 → Nov 28, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8901537B2 | Transistors with high concentration of boron doped germanium | Electricity | 47 | Active |
| US8847281B2 | High mobility strained channels for fin-based transistors | Electricity | 39 | Active |
| US8890119B2 | Vertical nanowire transistor with axially engineered semiconductor and gate metallization | Emerging Cross-Sectional Technologies | 20 | Active |
| US9306063B2 | Vertical transistor devices for embedded memory and logic technologies | Electricity | 17 | Active |
| US9627384B2 | Transistors with high concentration of boron doped germanium | Electricity | 12 | Active |
| US8558279B2 | Non-planar device having uniaxially strained semiconductor body and method of making same | Electricity | 11 | Active |
| US10868246B2 | Conductive bridge random access memory (CBRAM) devices with low thermal conductivity electrolyte sublayer | Physics | 9 | Active |
| US9184294B2 | High mobility strained channels for fin-based transistors | Electricity | 8 | Active |
| US8890120B2 | Tunneling field effect transistors (TFETs) for CMOS approaches to fabricating N-type and P-type TFETs | Electricity | 8 | Active |
| US10790281B2 | Stacked channel structures for MOSFETs | Electricity | 7 | Active |
| US9293560B2 | Vertical nanowire transistor with axially engineered semiconductor and gate metallization | Emerging Cross-Sectional Technologies | 6 | Active |
| US8592803B2 | Germanium-based quantum well devices | Electricity | 6 | Active |
| US8193523B2 | Germanium-based quantum well devices | Electricity | 6 | Active |
| US9935107B2 | CMOS FinFET device with dual strained cladding layers on relaxed SiGe fins, and method of fabricating the same | Electricity | 4 | Active |
| US10153372B2 | High mobility strained channels for fin-based NMOS transistors | Electricity | 3 | Active |
| US11107891B2 | Hexagonal arrays for quantum dot devices | Electricity | 3 | Active |
| US11387320B2 | Transistors with high concentration of germanium | Electricity | 2 | Active |
| US9219135B2 | Germanium-based quantum well devices | Electricity | 2 | Active |
| US11158731B2 | Quantum well stacks for quantum dot devices | Electricity | 2 | Active |
| US9871117B2 | Vertical transistor devices for embedded memory and logic technologies | Electricity | 2 | Active |
| US9893149B2 | High mobility strained channels for fin-based transistors | Electricity | 2 | Active |
| US10665770B2 | Fin strain in quantum dot devices | Electricity | 1 | Active |
| US9911835B2 | Tunneling field effect transistors (TFETs) for CMOS architectures and approaches to fabricating N-type and P-type TFETs | Electricity | 1 | Active |
| US10600787B2 | Silicon PMOS with gallium nitride NMOS for voltage regulation | Electricity | 1 | Active |
| US9871106B2 | Heterogeneous pocket for tunneling field effect transistors (TFETs) | Electricity | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.