Tsai-Fu Hsiao
17Patents
6h-index
40Co-inventors
66Inventor score
Filing activity: Aug 26, 1998 → Feb 3, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7473606B2 | Method for fabricating metal-oxide semiconductor transistors | Electricity | 19 | Active |
| US6112013A | Apparatus for detecting a crack in a heater of an acid and rinse bath and a method of crack detection of the same | Electricity | 14 | Expired |
| US7553763B2 | Salicide process utilizing a cluster ion implantation process | Electricity | 13 | Active |
| US7550336B2 | Method for fabricating an NMOS transistor | Electricity | 13 | Active |
| US8183118B2 | Method for fabricating MOS transistor | Electricity | 11 | Active |
| US7396717B2 | Method of forming a MOS transistor | Electricity | 10 | Expired |
| US7795101B2 | Method of forming a MOS transistor | Electricity | 6 | Active |
| US9502305B2 | Method for manufacturing CMOS transistor | Electricity | 2 | Active |
| US7927954B2 | Method for fabricating strained-silicon metal-oxide semiconductor transistors | Electricity | 2 | Active |
| US9006802B2 | Semiconductor device manufacturing methods and methods of forming insulating material layers | Electricity | 2 | Active |
| US9228260B1 | Wafer processing chamber, heat treatment apparatus and method for processing wafers | Electricity | 1 | Active |
| US7892935B2 | Semiconductor process | Electricity | 1 | Active |
| US8076210B2 | Method for fabricating metal-oxide semiconductor transistors | Electricity | 1 | Active |
| US9607826B2 | Semiconductor device manufacturing methods and methods of forming insulating material layers | Electricity | 0 | Active |
| US8053847B2 | Method for fabricating metal-oxide semiconductor transistors | Electricity | 0 | Active |
| US11244822B2 | Apparatus for manufacturing a thin film and a method therefor | Chemistry; Metallurgy | 0 | Active |
| US12014922B2 | Apparatus for manufacturing a thin film and a method therefor | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.