Yan Wang
70Patents
12h-index
126Co-inventors
87Inventor score
Filing activity: Dec 21, 2001 → Mar 27, 2025
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6776693B2 | Method and apparatus for face-up substrate polishing | Performing Operations; Transporting | 51 | Expired |
| US6899804B2 | Electrolyte composition and treatment for electrolytic chemical mechanical polishing | Electricity | 37 | Expired |
| US6991528B2 | Conductive polishing article for electrochemical mechanical polishing | Emerging Cross-Sectional Technologies | 25 | Expired |
| US6979248B2 | Conductive polishing article for electrochemical mechanical polishing | Emerging Cross-Sectional Technologies | 25 | Expired |
| US6988942B2 | Conductive polishing article for electrochemical mechanical polishing | Emerging Cross-Sectional Technologies | 25 | Expired |
| US7066800B2 | Conductive polishing article for electrochemical mechanical polishing | Emerging Cross-Sectional Technologies | 20 | Expired |
| US7107703B1 | Shoe sole | Human Necessities | 18 | Expired |
| USD842388S1 | Toy vehicle | General | 16 | Active |
| US7229535B2 | Hydrogen bubble reduction on the cathode using double-cell designs | Electricity | 15 | Expired |
| US7077721B2 | Pad assembly for electrochemical mechanical processing | Electricity | 14 | Expired |
| USD849400S1 | Passport wallet | General | 13 | Active |
| US7323416B2 | Method and composition for polishing a substrate | Electricity | 12 | Expired |
| US7128825B2 | Method and composition for polishing a substrate | Electricity | 12 | Expired |
| US6837983B2 | Endpoint detection for electro chemical mechanical polishing and electropolishing processes | Performing Operations; Transporting | 11 | Expired |
| US9336347B2 | Capacitor array and layout design method thereof | Electricity | 10 | Active |
| US7160432B2 | Method and composition for polishing a substrate | Electricity | 10 | Expired |
| US7655565B2 | Electroprocessing profile control | Chemistry; Metallurgy | 8 | Active |
| US8066552B2 | Multi-layer polishing pad for low-pressure polishing | Performing Operations; Transporting | 6 | Active |
| US7276743B2 | Retaining ring with conductive portion | Performing Operations; Transporting | 6 | Expired |
| USD933383S1 | Chair | General | 5 | Active |
| US11225180B2 | Automobile headrest | Performing Operations; Transporting | 5 | Active |
| US7232514B2 | Method and composition for polishing a substrate | Electricity | 5 | Expired |
| US7344431B2 | Pad assembly for electrochemical mechanical processing | Electricity | 5 | Active |
| US7790015B2 | Endpoint for electroprocessing | Electricity | 5 | Active |
| US7207878B2 | Conductive polishing article for electrochemical mechanical polishing | Emerging Cross-Sectional Technologies | 4 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.