Young-Hoon Park
123Patents
14h-index
162Co-inventors
89Inventor score
Filing activity: Dec 12, 1994 → Jul 8, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6579372B2 | Apparatus and method for depositing thin film on wafer using atomic layer deposition | Emerging Cross-Sectional Technologies | 131 | Expired |
| US5545578A | Method of maufacturing a semiconductor device having a low resistance gate electrode | Electricity | 84 | Expired |
| US6573184B2 | Apparatus and method for depositing thin film on wafer using atomic layer deposition | Emerging Cross-Sectional Technologies | 39 | Expired |
| USD644677S1 | Camera for closed circuit television | General | 38 | Expired |
| US7338832B2 | CMOS image sensor and method of fabricating the same | Electricity | 37 | Active |
| US6563162B2 | Semiconductor memory device for reducing parasitic bit line capacitance and method of fabricating the same | Electricity | 30 | Expired |
| USD647553S1 | Camera for closed circuit television | General | 28 | Expired |
| US6566735B1 | Integrated circuit chip having anti-moisture-absorption film at edge thereof and method of forming anti-moisture-absorption film | Electricity | 23 | Expired |
| US6465895B1 | Bonding pad structures for semiconductor devices and fabrication methods thereof | Electricity | 19 | Expired |
| US6448113B2 | Method of forming fuse area structure including protection film on sidewall of fuse opening in semiconductor device | Electricity | 17 | Expired |
| US6796316B2 | Atomic layer deposition (ALD) thin film deposition equipment having cleaning apparatus and cleaning method | Emerging Cross-Sectional Technologies | 16 | Expired |
| US7005689B2 | Image sensor and method of fabricating the same | Electricity | 15 | Expired |
| US6884297B2 | Thin film deposition reactor | Chemistry; Metallurgy | 15 | Expired |
| US8138530B2 | CMOS image sensor having a crosstalk prevention structure | Electricity | 14 | Active |
| US6852168B2 | Reactor for depositing thin film on wafer | Chemistry; Metallurgy | 14 | Expired |
| US6767439B2 | High throughput thin film deposition and substrate handling method and apparatus for optical disk processing | Chemistry; Metallurgy | 13 | Expired |
| US7057219B2 | CMOS image sensor and method of fabricating the same | Electricity | 11 | Expired |
| US7842606B2 | Method of depositing thin film and method of manufacturing semiconductor using the same | Emerging Cross-Sectional Technologies | 10 | Expired |
| US7531857B2 | Image sensor with buried barrier layer having different thickness according to wavelength of light and method of forming the same | Electricity | 8 | Active |
| US6616754B1 | Segregation reducing agent consisting of curdlan and alkaline solution and hydraulic composition containing the segregation reducing agent | Chemistry; Metallurgy | 7 | Expired |
| US6071725A | Vectors expressing ice nucleation protein fusions for cell surface anchoring of foreign proteins | Chemistry; Metallurgy | 7 | Expired |
| US6555450B2 | Contact forming method for semiconductor device | Electricity | 7 | Expired |
| US6507086B1 | Fuse area structure having guard ring surrounding fuse opening in semiconductor device and method of forming the same | Electricity | 7 | Expired |
| US6509255B2 | Fuse area structure having guard ring surrounding fuse opening in semiconductor device and method of forming the same | Electricity | 7 | Expired |
| US7545423B2 | Image sensor having a passivation layer exposing at least a main pixel array region and methods of fabricating the same | Electricity | 7 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.