Brian Reiss
26Patents
4h-index
35Co-inventors
63Inventor score
Filing activity: Oct 2, 2000 → Jan 26, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7045049B1 | Method of manufacture of colloidal rod particles as nanobar codes | Chemistry; Metallurgy | 41 | Expired |
| US9505952B2 | Polishing composition containing ceria abrasive | Electricity | 13 | Active |
| US9238753B2 | CMP compositions selective for oxide and nitride with high removal rate and low defectivity | Electricity | 9 | Active |
| US7374893B2 | Peptide mediated synthesis of metallic and magnetic materials | Chemistry; Metallurgy | 7 | Active |
| US8697576B2 | Composition and method for polishing polysilicon | Electricity | 4 | Active |
| US9597768B1 | Selective nitride slurries with improved stability and improved polishing characteristics | Chemistry; Metallurgy | 3 | Active |
| US8273142B2 | Silicon polishing compositions with high rate and low defectivity | Chemistry; Metallurgy | 2 | Active |
| US9279067B2 | Wet-process ceria compositions for polishing substrates, and methods related thereto | Performing Operations; Transporting | 2 | Active |
| US7922926B2 | Composition and method for polishing nickel-phosphorous-coated aluminum hard disks | Chemistry; Metallurgy | 1 | Active |
| US9281210B2 | Wet-process ceria compositions for polishing substrates, and methods related thereto | Chemistry; Metallurgy | 1 | Active |
| US8815110B2 | Composition and method for polishing bulk silicon | Electricity | 1 | Active |
| US9758697B2 | Polishing composition containing cationic polymer additive | Electricity | 0 | Active |
| US9481215B2 | Air pressure control system | Performing Operations; Transporting | 0 | Active |
| US8916061B2 | CMP compositions selective for oxide and nitride with high removal rate and low defectivity | Electricity | 0 | Active |
| US9302554B2 | Air pressure control system | Performing Operations; Transporting | 0 | Active |
| US10414947B2 | Polishing composition containing ceria particles and method of use | Chemistry; Metallurgy | 0 | Active |
| US12398293B2 | Composition and method for polishing boron doped polysilicon | Chemistry; Metallurgy | 0 | Active |
| US9425037B2 | Silicon polishing compositions with improved PSD performance | Chemistry; Metallurgy | 0 | Active |
| US9340706B2 | Mixed abrasive polishing compositions | Electricity | 0 | Active |
| US12157834B2 | Composition and method for polysilicon CMP | Electricity | 0 | Active |
| US6780301B1 | Method of manufacture of colloidal rod particles as nanobar codes | General | 0 | Revoked |
| US9701871B2 | Composition and method for polishing bulk silicon | Electricity | 0 | Active |
| US8969252B2 | Peptide mediated synthesis of metallic and magnetic materials | Chemistry; Metallurgy | 0 | Active |
| US8883034B2 | Composition and method for polishing bulk silicon | Electricity | 0 | Active |
| US11802220B2 | Silica-based slurry for selective polishing of carbon-based films | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.