Inventor · Allschwil, CH

Julian Proelss

18Patents
2h-index
23Co-inventors
50Inventor score

Filing activity: Jan 24, 2006 → Sep 14, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US9765239B2 Use of a chemical-mechanical polishing (CMP) composition for polishing a substrate or layer containing at least one III-V material Electricity 2 Active
US10385236B2 Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates Electricity 2 Active
US10899945B2 Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates Electricity 2 Active
US9828527B2 Chemical-mechanical polishing compositions comprising N,N,N′,N′-tetrakis-(2-hydroxypropyl)-ethylenediamine or methanesulfonic acid Electricity 1 Active
US8969276B2 Aqueous acidic etching solution and method for texturing the surface of single crystal and polycrystal silicon substrates Emerging Cross-Sectional Technologies 0 Active
US10844333B2 Composition for post chemical-mechanical-polishing cleaning Chemistry; Metallurgy 0 Active
US11993729B2 Chemical mechanical polishing composition Electricity 0 Active
US11286402B2 Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates Electricity 0 Active
US11725117B2 Chemical mechanical polishing of substrates containing copper and ruthenium Chemistry; Metallurgy 0 Active
US10844325B2 Composition for post chemical-mechanical-polishing cleaning Chemistry; Metallurgy 0 Active
US8119097B2 Method for producing nanoparticulate solid materials Mechanical Engineering; Lighting; Heating 0 Active
US10738219B2 Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates Chemistry; Metallurgy 0 Active
US10090159B2 Chemical-mechanical polishing compositions comprising one or more polymers selected from the group consisting of N-vinyl-homopolymers and N-vinyl copolymers Electricity 0 Active
US10865361B2 Composition for post chemical-mechanical-polishing cleaning Chemistry; Metallurgy 0 Active
US10570316B2 Chemical mechanical polishing (CMP) composition Chemistry; Metallurgy 0 Active
US9862862B2 Chemical-mechanical polishing compositions comprising polyethylene imine Electricity 0 Active
US11264250B2 Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates Chemistry; Metallurgy 0 Active
US12351737B2 Chemical mechanical polishing of substrates containing copper and ruthenium Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.