Ming-Shing Chen
17Patents
3h-index
27Co-inventors
60Inventor score
Filing activity: Mar 11, 1999 → Nov 21, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6319826A | Method of fabricating barrier layer | Electricity | 11 | Expired |
| US7592262B2 | Method for manufacturing MOS transistors utilizing a hybrid hard mask | Electricity | 6 | Active |
| US9385236B1 | Fin shaped semiconductor device structures having tipped end shape and method for fabricating the same | Electricity | 6 | Active |
| US10134744B1 | Semiconductor memory device | Electricity | 3 | Active |
| US6291301A | Fabrication method of a gate junction conductive structure | Electricity | 3 | Expired |
| US9490360B2 | Semiconductor device and operating method thereof | Electricity | 2 | Active |
| US6194298A | Method of fabricating semiconductor device | Electricity | 1 | Expired |
| US9379237B1 | Lateral diffused metal-oxide-semiconductor device | Electricity | 1 | Active |
| US6462390B1 | Multi-film capping layer for a salicide process | Electricity | 1 | Expired |
| US9461166B2 | Lateral-diffused metal oxide semiconductor device and fabricating method thereof | Electricity | 0 | Active |
| US9236289B1 | Shallow trench isolation structures in semiconductor device and method for manufacturing the same | Electricity | 0 | Active |
| US9780171B2 | Fabricating method of lateral-diffused metal oxide semiconductor device | Electricity | 0 | Active |
| US11387241B2 | Method for fabricating flash memory | Electricity | 0 | Active |
| US9478457B2 | Shallow trench isolation structures in semiconductor device and method for manufacturing the same | Electricity | 0 | Active |
| US11881493B2 | Semiconductor image sensor device | Electricity | 0 | Active |
| US11538844B2 | Semiconductor image sensor device and fabrication method thereof | Electricity | 0 | Active |
| US10636671B1 | Planarization process | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.